Browsing by Author "Ma, MW"

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Fully silicided NiSi gate on La2O3 MOSFETs
(2003-05-01)
Lin, CY
;
Ma, MW
;
Chin, A
;
Yeo, YC
;
Zhu, CX
We have fabricated the fully silicided NiSi on La2O3 for n- and p-MOSFETs. For 900 degreesC fully silicided CoSi2 on La2O3 gate dielectric with 1.5 mn EOT, the, gate dielectric has large leakage current by possible excess Co diffusion at high silicidation temperature. In sharp contrast, very low gat e leakage current density of 2 x 10(-4) A/cm(2) at 1 V is measured for 400 degreesC formed fully silicided NiSi and comparable with Al gate. The extracted work function of NiSi was 4.42 eV, and the corresponding threshold voltages are 0.12 and -0.70 V for respective n- and p-MOSFETs. Electron and hole mobilities of 156 and 44 cm(2)/V-s are obtained for respective n- and p-MOSFETs, which are comparable with the HfO2 MOSFETs without using H-2 annealing.
Modeling finger number dependence on RF noise to 10 GHz in 0.13 mu m node MOSFETs with 80nm gate length
(2004)
King, MC
;
Lai, ZM
;
Huang, CH
;
Lee, CF
;
Ma, MW
We have modeled the as-measured and de-embedded NFmin on multi-fingers 0.13 mum node MOSFETs. In contrast to the as-measured large NFmin value and strong dependence on parallel gate fingers, the de-embedded NFmin. has much smaller noise of only 1.1-1.2 dB for 6, 18 and 36 fingers and weak dependence. From the well calibrated equivalent circuit model with as-measured NFmin, the dominant noise source is from the probing pad generated thermal noise. From our derived equation with excellent agreement with de-embedded NFmin to 10 GHz, the weak dependence of intrinsic NFmin on gate finger is due to the combined effect of R(g)g(m) and drain hot carrier noise but both have weak dependence on finger numbers.