Browsing by Author "Ma, Yuan-Ron"

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Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma-assisted molecular beam epitaxy
(2014-12-17)
Yu, Ing-Song
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Chang, Chun-Pu
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Yang, Chung-Pei
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Lin, Chun-Ting
;
Ma, Yuan-Ron
In this report, self-organized GaN nanodots have been grown on Si (111) by droplet epitaxy method, and their density can be controlled from 1.1 x 10(10) to 1.1 x 10(11) cm(-2) by various growth parameters, such as substrate temperatures for Ga droplet formation, the pre-nitridation treatment of Si substrate, the nitridation duration for GaN crystallization, and in situ annealing after GaN formation. Based on the characterization of in situ RHEED, we can observe the surface condition of Si and the formation of GaN nanodots on Si. The surface nitridaiton treatment at 600 degrees C provides a-SiNx layer which makes higher density of GaN nanodots. Crystal GaN nanodots can be observed by the HRTEM. The surface composition of GaN nanodots can be analyzed by SPEM and mu-XPS with a synchrotron x-ray source. We can find GaN nanodots form by droplet epitaxy and then in situ annealing make higher-degree nitridation of GaN nanodots.
Intriguing field-effect-transistor performance of two-dimensional layered and crystalline CrI3
(2020-03-01)
Patil, Ranjit A.
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Tu, Hao-Wei
;
Jen, Ming-Hsing
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Lin, Jing-Jia
;
Wu, Ching-Cherng
There are many candidate materials that can be used as channel materials for the next-generation field effect transistors (FETs). CrI3 is one of the particular candidates for application in FET, because it is a two-dimensional (2D) ferromagnet and has giant tunneling magnetoresistance. The ferromagnetic nature extends to not only electronics but also spintronics. In this study, the large-area, layered, and crystalline 2D CrI3 were synthesized by horizontal Bridgman method. The suspended CrI3 FETs were fabricated for explorations of intrinsic electron transport in the CrI3 channel and of electrical contact problems. The suspended FET structure lets the CrI3 channel free from trapping charges in the SiO2-capped Si substrate. The oneoff ratio of the suspended CrI3 FET is up to 10(4), making the 2D layered CrI3 potential for future FETs. The investigations of the mobility and the interface-trap density at various temperatures reveal that the trapping charges as well as the interface-trap densities are increased with further gas adsorption on the surface of the CrI3 flake. The performance of the suspended CrI3 FET can be improved, if the gas adsorption problem can be carefully treated. (c) 2020 Elsevier Ltd. All rights reserved.