Browsing by Author "PENG, NT"
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Item type:Item, KEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE)(1991-03-01) ;LOONG, WA ;PENG, NT ;交大名義發表 ;應用化學系National Chiao Tung UniversityThe exposure characteristics of poly(methylisopropenylketone) (PMIPK) and poly(phenylisopropenylketone) (PPIPK) exposed to 40 and 80 keV H+ and B+ ion beams have been studied. It is found that the electron-rich phenyl group in PPIPK has increased stopping power for the bigger B+ ion, but not for the smaller H+ ion. For the same reason, the main chain scissioning of PPIPK is slower than that of PMIPK when they are exposed to B+, but not to H+, under the same exposure conditions. Linear relationships are found with simulation parameter A which stands for exposure efficiency of the ion beam as a function of exposure doses (keV x ion fluence) for a specific ion-exposed polymer within the used energy range.