Browsing by Author "Pan, YC"

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A high-temperature thermodynamic model for metalorganic vapor phase epitaxial growth of InGaN
(1999-09-01)
Ou, J
;
Pan, YC
;
Lee, WH
;
Shu, CK
;
Lin, HC
A thermodynamic analysis tailored with a high-temperature parameter was performed for metalorganic vapor phase epitaxial (MOVPE) growth of InxGa1-xN alloys. Accordingly, a series of InGaN samples were prepared under various input In flow rates and growth temperatures. Theoretical results indicate that the In solid concentration tends to increase with increasing In flow rate and with decreasing temperature, whereas the metal droplets form more easily on the surface at lower growth temperatures and higher In fluxes, which are in good agreement with our experimental data.
An elucidation of solid incorporation of InGaN grown by metalorganic vapor phase epitaxy
(1998-06-01)
Ou, J
;
Chen, WK
;
Lin, HC
;
Pan, YC
;
Lee, MC
We carried out a systematic study on the solid incorporation of InGaN under various growth conditions using metalorganic vapor phase epitaxy (MOVPE). The solid distribution of InGaN was found to be very sensitive to the growth temperature, and the TMGa and TMIn flow rates. Experimental results indicated that at low Ga flow rates InGaN growth is essentially governed by thermodynamic factors, whereas at high growth rate the InGaN solid concentration is determined merely by the vapor composition in the gas phase. In regard to the effect of TMIn flow rates on InGaN growth, it was found that once In droplets form on the surface, the In growth efficiency correspondingly decreases significantly; accounting for the low In solid concentration in InGaN at high TMIn flow rates.
Gallium K-edge EXAFS study of GaN : Mg films
(2000)
Pan, YC
;
Wang, SF
;
Lee, WH
;
Lin, WC
;
Shu, CK
Ga K-edge extended X-ray absorption fine structure (EXAFS) measurement was employed to investigate the local structure of GaN:Mg films grown by metalorganic vapor phase epitaxy (MOVPE) with various Cp,Mg dopant flow rates using both in-plane and out-of-plane polarization modes of X-ray. The near edge absorption spectra were found to depend on X-ray polarization strongly for undoped GaN sample and weakly to minutely for heavily Mg-doped and amorphous films. The results indicate Mg incorporation modifies the local structure around the absorber Ga atom and, hence, alters the molecular orbital electron transition of GaN sample. EXAFS analysis showed both vacancy and Mg-interstitial defects contribute to the reduction of coordination numbers along the hexagonal c-axis of GaN:Mg film.
Gallium K-edge x-ray absorption study on Mg-doped GaN
(2001-01-01)
Pan, YC
;
Wang, SF
;
Lee, WH
;
Lee, MC
;
Chen, WK
Ga K-edge x-ray absorption measurements were employed to investigate Mg-doping effects in GaN samples. Strong polarization-dependent x-ray absorption near-edge structures become less pronounced with increasing doping concentration, indicating the formation of a mixing-phase structure of cubic and hexagonal phases. Analysis of the extended x-ray absorption region of the spectra revealed doping-related defects such as vacancies, substitutions, and interstitial occupations. They were formed anisotropically in the crystal c axis direction and its perpendiculars. Disorderliness arising from phase mix and defects is believed to have lowered the Debye temperature of the doped GaN films and caused the destructive interference of the absorption fine-structure oscillation functions. These effects were taken into account for the observed large coordination number reductions in our samples. (C) 2001 American Institute of Physics.
Growth and X-ray characterization of an InN film on sapphire prepared by metalorganic vapor phase epitaxy
(1997-12-15)
Chen, WK
;
Pan, YC
;
Lin, HC
;
Ou, J
;
Chen, WH
We report the successful growth of an InN film by metalorganic vapor phase epitaxy. The film quality is found to be strongly dependent on the growth temperature and the TMIn reactant flow rate. The best quality epilayer was obtained at 375 degrees C under a high V/III ratio growth environment. It exhibits a FWHM of the X-ray rocking curve as narrow as 96 arcsec: which explains the superior crystalline quality of our epitaxial film.
Growth and X-ray characterization of an InN film on sapphire prepared by metalorganic vapor phase epitaxy
(1997-12-15)
Chen, WK
;
Pan, YC
;
Lin, HC
;
Ou, J
;
Chen, WH
We report the successful growth of an InN film by metalorganic vapor phase epitaxy. The film quality is found to be strongly dependent on the growth temperature and the TMIn reactant flow rate. The best quality epilayer was obtained at 375 degrees C under a high V/III ratio growth environment. It exhibits a FWHM of the X-ray rocking curve as narrow as 96 arcsec: which explains the superior crystalline quality of our epitaxial film.
Influence of sapphire nitridation on properties of indium nitride prepared by metalorganic vapor phase epitaxy
(1999-02-01)
Pan, YC
;
Lee, WH
;
Shu, CK
;
Lin, HC
;
Chiang, CI
Indium nitride films have been successfully grown on (0001) sapphire substrates by metalorganic vapor phase epitaxy (MOVPE) using TMIn and NH3 as source precursors. Experimental results indicated that pregrowth treatments, such as buffer layer growth, nitridation temperature and nitridation duration have dramatic effects on the growth of the InN films. For films nitridated at 1,000 degrees C for 40 min without any buffer layer growth, we obtained an InN film quality with Hall mobility, carrier concentration and line width of Raman E-2 mode of 270 cm(2)/V.s, 5 x 10(19) cm(-3) and 4.5 cm(-1), respectively, which is among the best quality ever reported for such type of film grown by MOVPE.
Long-term photocapacitance decay behavior in undoped GaN
(2001-10-01)
Chung, HM
;
Pan, YC
;
Chuang, WC
;
Chen, NC
;
Tsai, CC
We have measured the dynamic response of the photocapacitance of a Schottky diode made of an undoped GaN epilayer grown by metalorganic vapor phase epitaxy. The measurements were performed after the suspension of a white light for a specified "waiting" time, t. The results indicate that the capacitance exhibits a logarithmic function of t from which a time constant of approximately 34.5 s and a cross-sectional area of less than 2.89 x 10(-27) cm(2) were retrieved. These are interpreted as the characteristic time and the cross-sectional area of electron capture by the traps associated with dislocations formed in the epifilm, respectively.
Long-term photocapacitance decay behavior in undoped GaN
(2000)
Chung, HM
;
Pan, YC
;
Chung, WC
;
Chen, NC
;
Tsai, CC
We have employed the photocapacitance measurement to examine the physical properties of GaN Schottky diode made from the undoped epilayer grown by metalorganic vapor phase epitaxy. The resulted transient capacitance spectrum shows that the diode exhibits a characteristic of long-term logarithmic-type decaying behavior, which, we believe, is correlated closely to the linear arranged traps close to the core of the threading edge dislocations.
Luminescence intensity reduction in Mg-doped GaN grown by metalorganic chemical vapor phase epitaxy
(2001-04-01)
Shu, CK
;
Chen, HH
;
Lee, WH
;
Pan, YC
;
Huang, HY
Photoluminescence dynamic responses of a heavily Mg-doped GaN grown by metalorganic chemical vapor phase epitaxy have been investigated. As the probe power density increased from 2.5 to 925 W/cm(2), a Mg-related emission band shifted from 2.82 to 3.16 eV revealing characteristics of donor-acceptor pair recombination. The intensity evolution also showed slow decay that suggests the metastable emission behavior. A simple potential barrier model was proposed to occur between the Mg related deep levels and common Mg acceptor level, which impedes electron relaxation and thus slows down the luminescence decay. From the variation of decay time constant with temperature. a barrier energy was deduced to be about 69 meV which is very close to the electrical result of 68 meV.
Metastable photoluminescence in heavily Mg-doped GaN grown by metalorganic chemical vapor phase epitaxy
(2000)
Shu, CK
;
Lee, WH
;
Pan, YC
;
Huang, HY
;
Chen, HH
The long-term transient spectra of heavily Mg-doped GaN have been investigated. As the excitation power density increased, the broad Mg-induced emission band showed blue-shift revealing characteristic of donor-acceptor pair (DAP) recombination. We also observed an unusually slow intensity decay. The characteristic time constants range from several tenths to a few hundred seconds for emission between 360 and 460 nm. Our results are interpreted in terms of metastability due to compounded effects of differential DAP population and recombination rates and uneven acceptor distribution.
Optical and electrical investigations of isoelectronic In-doped GaN films
(2000)
Shu, CK
;
Lee, WH
;
Pan, YC
;
Chen, CC
;
Lin, HC
The optical and electrical properties of isoelectronic In-doped GaN films grown by metalorganic vapor phase epitaxy (MOVPE) were investigated by X-ray, photoluminescence (PL), Hall and Raman measurements. As a result, adequate In-doping quantity causes not only a reduction of yellow luminescence and unintentional background concentration, but an enhanced mobility and decrease in the widths. The improved crystalline and optical qualities of GaN films may be attributed to the decrease in defects. (C) 2000 Elsevier Science Ltd. All rights reserved.
Photoluminescence and photoluminescence excitation studies of as-grown and P-implanted GaN: On the nature of yellow luminescence
(2002-05-06)
Huang, HY
;
Chuang, CH
;
Shu, CK
;
Pan, YC
;
Lee, WH
We have studied optical and electronic properties of isoelectronic P-implanted GaN films grown by metalorganic chemical vapor phase epitaxy. After rapid thermal annealing, a strong emission band around 430 nm was observed, which is attributed to the recombination of exciton bound to isoelectronic P-hole traps. From the Arrhenius plot, the hole binding energy of similar to180 meV and the exciton localization energy of 28 meV were obtained. According to first-principle total-energy calculations, the implantation process likely introduced N(I) and P-related defects. By using photoluminescence excitation technique, we found that the P-implantation-induced localized states not only increase the yellow luminescence but also suppress the transitions from the free carriers to deep levels. (C) 2002 American Institute of Physics.
Raman and X-ray studies of InN films grown at different temperatures by metalorganic vapor phase epitaxy
(1998-09-01)
Chen, WK
;
Lin, HC
;
Pan, YC
;
Ou, J
;
Shu, CK
We used Raman scattering and X-ray diffraction (XRD) methods to investigate the properties of InN films deposited at temperatures ranging from 325 to 600 degrees C by metalorganic vapor phase epitaxy (MOVPE). Significant line broadening, softening and intensity evolution were observed from films at growth temperatures between 375 and 450 degrees C. This can be attributed to the formation of mixed hexagonal and cubic structures and related dislocation defects. As the growth temperature was further increased, the hexagonal phase tvas found to be dominant in the deposited InN film.
Raman and x-ray studies of InN films grown by metalorganic vapor phase epitaxy
(1998-11-02)
Lee, MC
;
Lin, HC
;
Pan, YC
;
Shu, CK
;
Ou, J
Thin InN films were deposited on the (0001) sapphire substrate at various temperatures from 325 to 600 degrees C by metalorganic vapor phase epitaxy. We used Raman scattering and x-ray diffraction to investigate the film properties and crystalline structures. Significant line broadening, softening and intensity evolution were observed at the growth temperatures between 375 and 450 degrees C. This can be attributed to the formation of the mixed hexagonal and cubic structures and the related dislocation defects. As the growth temperature is further increased, the hexagonal phase is found to be dominant in the deposited InN film. (C) 1998 American Institute of Physics. [S0003-6951(98)00744-X].
Structure study of GaN : Mg films by X-ray absorption near-edge structure spectroscopy
(2001)
Pan, YC
;
Wang, SF
;
Lee, WH
;
Lin, WC
;
Chiang, CI
X-ray absorption near-edge fine structure (XANES) spectroscopy from N K-edge measurement was employed to examine the crystal structure of metallorganic vapor phase epitaxy (MOVPE) grown Mg-doped GaN (GaN:Mg) films. The result showed that Mg doping induced crystal stacking faults to occur at the film surface causing a fraction of hexagonal phase to transform into cubic phase. As a consequence of this, XANES spectra of the films were found to vary with the dopant concentration and to lose pure hexagonal character when examined with the incident angle theta of the X-ray beam. Spectral characteristic variation between the two phases allows us to estimate the phase composition of the samples. The trend of increasing cubic phase component in dopant concentration is consistent with the observed Normaski optical micrograph. (C) 2001 Published by Elsevier Science Ltd.
The effects of isoelectronic in-doping in GaN films grown by MOCVD
(1998)
Shu, CK
;
Ou, J
;
Lin, HC
;
Pan, YC
;
Lee, WH
The isoelectronic In-doping effect in GaN films grown by metalorganic chemical vapor deposition (MOCVD) was investigated by using Raman scattering, scanning electron microscopy (SEM), Hall, Xray and photoluminescence (PL) measurements. In our study, after incorporating small amounts of In atoms into GaN compound (less than 0.4%, thus no alloy), SEM pictures showed improved surface smoothness with greatly reduced nano-pits, which was also confirmed by the multiple interference effects in PL spectra. Doping of adequate quantity caused the reduction of yellow luminescence and unintentional background concentration, and the line width shrinkage in X-ray, PL and Raman data, and the enhanced mobility. The improved crystalline and optical qualities of GaN:In films may be attributed to the decrease in dislocation density that may be related to the "impurity softening" phenomena.