Browsing by Author "Shieh, Jia-Ming"

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AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
(2017-04-27)
Tzou, An-Jye
;
Chu, Kuo-Hsiung
;
Lin, I-Feng
;
Ostreng, Erik
;
Fang, Yung-Sheng
We report a low current collapse GaN-based high electron mobility transistor (HEMT) with an excellent thermal stability at 150 degrees C. The AlN was grown by N-2-based plasma enhanced atomic layer deposition (PEALD) and shown a refractive index of 1.94 at 633 nm of wavelength. Prior to deposit AlN on III-nitrides, the H-2/NH3 plasma pretreatment led to remove the native gallium oxide. The X-ray photoelectron spectroscopy (XPS) spectroscopy confirmed that the native oxide can be effectively decomposed by hydrogen plasma. Following the in situ ALD-AlN passivation, the surface traps can be eliminated and corresponding to a 22.1% of current collapse with quiescent drain bias (V-DSQ) at 40 V. Furthermore, the high temperature measurement exhibited a shift-free threshold voltage (V-th), corresponding to a 40.2% of current collapse at 150 degrees C. The thermal stable HEMT enabled a breakdown voltage (BV) to 687 V at high temperature, promising a good thermal reliability under high power operation.
Transparent planar indium tin oxide for a thermo-photovoltaic selective emitter
(2020-09-01)
Chen, Yu-Bin
;
Parashar, Parag
;
Yang, Yi-Hua
;
Rawat, Tejender Singh
;
Chen, Shih-Wei
Designing an efficient emitter design is an important step for achieving a highly efficient TPV conversion process. Wavelength-selective emissivity, spectra match between the emitter and TPV cells, and high thermal stability are three main characteristics that must be considered before implementing the emitter. In this work, an indium tin oxide (ITO)/sapphire emitter structure is investigated for TPV application over the temperature range from 200 degrees C to 1000 degrees C. A 1-mu m-thick ITO layer is deposited on a 650-mu m-thick sapphire substrate. In addition, 50-nm-thick SiO2 is deposited on top of the ITO to enhance the performance of emitter at high temperatures. High-temperature emissivity and absorptivity measurement of the emitter samples are obtained using FTIR and a Hitachi U-4100 spectrophotometer, respectively. The resultant SiO2/ITO/sapphire/stainless-steel planar emitter structure has selective emission with high emissivity of similar to 0.8 in the 1-1.6 mu m wavelength regime at 1000 degrees C. This emission range lies at the bandgap edge of silicon TPV cells and thus can be used to harness the true potential for making a low-cost thermophotovoltaic system. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement