Browsing by Author "Shih, WP"

Now showing 1 - 3 of 3

High precision, low cost mask for deep x-ray lithography
(1998-02-01)
Shew, BY
;
Cheng, Y
;
Shih, WP
;
Lu, M
;
Lee, WH
The precision of transferred patterns are highly dependent on the quality of the mask in deep x-ray lithography. Many parameters, such as the critical energy of the synchrotron light, beamline optics and even the microstructure to be exposed should be considered in mask design. In this paper, the design rules and the boundary conditions for deep x-ray mask are discussed in general. The method of making a precision, multilayer mask using UV lithography technique is also described.
High precision, low cost mask for deep x-ray lithography
(1998-02-01)
Shew, BY
;
Cheng, Y
;
Shih, WP
;
Lu, M
;
Lee, WH
The precision of transferred patterns are highly dependent on the quality of the mask in deep x-ray lithography. Many parameters, such as the critical energy of the synchrotron light, beamline optics and even the microstructure to be exposed should be considered in mask design. In this paper, the design rules and the boundary conditions for deep x-ray mask are discussed in general. The method of making a precision, multilayer mask using UV lithography technique is also described.
Micromachining program status at the SRRC
(1997-12-01)
Cheng, Y
;
Shew, BY
;
Shih, WP
;
Wang, SS
;
Lin, CY
This paper describes the micromachining program status of the micromachining laboratory at the SRRC. A preliminary LIGA process has been established. Many joint projects with local and foreign institutes to develop devices for domestic industries have been started. The interests in the application of the LIGA technology is continuously growing in Taiwan. Two-millimeter ultra-deep microstructures have been achieved.