Browsing by Author "Tang, Shun-Wei"

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Investigation of Recessed Gate AlGaN/GaN MIS-HEMTs with Double AlGaN Barrier Designs toward an Enhancement-Mode Characteristic
(2020-02-01)
Wu, Tian-Li
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Tang, Shun-Wei
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Jiang, Hong-Jia
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國際半導體學院
;
International College of Semiconductor Technology
In this work, recessed gate AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) with double AlGaN barrier designs are fabricated and investigated. Two different recessed depths are designed, leading to a 5 nm and a 3 nm remaining bottom AlGaN barrier under the gate region, and two different Al% (15% and 20%) in the bottom AlGaN barriers are designed. First of all, a double hump trans-conductance (g(m))-gate voltage (V-G) characteristic is observed in a recessed gate AlGaN/GaN MIS-HEMT with a 5 nm remaining bottom Al0.2Ga0.8N barrier under the gate region. Secondly, a physical model is proposed to explain this double channel characteristic by means of a formation of a top channel below the gate dielectric under a positive V-G. Finally, the impacts of Al% content (15% and 20%) in the bottom AlGaN barrier and 5 nm/3 nm remaining bottom AlGaN barriers under the gate region are studied in detail, indicating that lowering Al% content in the bottom can increase the threshold voltage (V-TH) toward an enhancement-mode characteristic.
Investigation of the degradations in power GaN-on-Si MIS-HEMTs subjected to cumulative gamma-ray irradiation
(2019-09-01)
Sharma, Chandan
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Modolo, Nicola
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Chen, Hsi-Han
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Tseng, Yang-Yan
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Tang, Shun-Wei
In this work, GaN-on-Si power Metal-Insulator-Semiconductor High Electron Mobility Transistors(MIS-HEMTs) are irradiated through different regimes of cumulative gamma-ray irradiation, namely 1, 2, 3, 4, and 5 kGy for the first sample; 1, 3, and 5 kGy for the second sample; 1, 5, and 10 kGy for the third sample; and 1, 10, and 20 kGy for the fourth sample. After each irradiation dose, drain current (ID), threshold voltage (I-g), and gate leakage current (Is) are electrically characterized in all the samples. An improvement in I-D with a shift in V-Th is observed in all the samples, which saturates after a higher irradiation dose. X-ray photoelectron spectroscopy (XPS) analysis confirms creation of nitrogen vacancies that act as donor and improves the I-D. No significant change in I-g is observed except for an increase in noise in gate leakage current. Scanning electron microscopy (SEM) shows the Al-based metallization pad degrades due to formation of small cavities. Finally, energy dispersive X-ray (EDX) analysis confirms the formation of Al native oxides due to gamma-ray irradiation.