Browsing by Author "Tsai, AW"
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Item type:Item, Different approaches for reliability enhancement of p-channel flash memory(2004) ;Chung, SS ;Chen, YJ ;Tsai, AW ;電子工程學系及電子研究所Department of Electronics Engineering and Institute of ElectronicsIn this paper, we will demonstrate two different strategies for designing p-channel flash memories, for achieving better reliability, in particular data retention and drain-disturb. The first one is by using a gate-engineering approach and the other one is using a newly developed substrate bias enhanced Avalanche Hot Electron (ABE) injection programming scheme. For the former, a p-doped floating gate on both p-channel flash cells can be achieved with superior data retention characteristics as well as a 3-order improvement of the drain disturb. For the latter, it exhibits much higher speed and much lower voltage for programming, and very good drain disturb characteristics.