Browsing by Author "Wang, Chin Meng"
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Item type:Item, Enhancement of Stress-Memorization Technique on nMOSFETs by Multiple Strain-Gate Engineering(2009) ;Lu, Tsung Yi ;Wang, Chin Meng ;Chao, Tien-Sheng ;電子物理學系Department of ElectrophysicsAn enhanced stress memorization-technique that utilizes a strain proximity free technique (SPFT) and a stacked-gate structure has been demonstrated by multiple strain-gate engineering. The electron mobility of n-channel metal-oxide semiconductor field effect transistors (nMOSFETs) with SPFT exhibit a 16% increase compared to that of counterpart techniques. SPFT avoids the limitation of stressor volume for performance improvement in high-density complementary metal oxide semiconductor circuits. We also found that optimization of stacked, random poly-Si-grain gate structure in combination with SPFT can improve mobility further to 22% more than a single poly-Si gate structure without SPFT.