Browsing by Author "Wang, T. C."

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Characteristics of a-plane GaN with the SiN(x) insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
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Wang, T. C.
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Huang, H. M.
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Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiN(x) insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiN(x) layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiN(x) insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiN(x) insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Characteristics of a-plane GaN with the SiNx insertion layer grown by metal-organic chemical vapor deposition
(2008-11-15)
Ko, T. S.
;
Wang, T. C.
;
Huang, H. M.
;
Chen, J. R.
;
Chen, H. G.
We utilized in-situ-grown SiNx insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiNx layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiNx insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiNx insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
Copper voids improvement for the copper dual damascene interconnection process
(2008-02-01)
Wang, T. C.
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Wang, Y. L.
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Hsieh, T. E.
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Chang, S. C.
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Cheng, Y. L.
The mechanism of copper (Cu) voids formation from electro-chemical plating (ECP) followed by Cu chemical mechanical polishing (CMP) are studied in Cu dual-damascene interconnection. The formation of Cu voids at metal lines is the main problem that causes not only the failure of via-induced metal-island corrosion but also yield loss. The galvanic theory and Cu lifting mechanism are proposed to explain the dependence of Cu-void performance on the Cu grain size and the benzotriazole (BTA, C6H5N3) flow rates. In the integration process of Cu interconnects, it is found that the smaller Cu grain size in ECP conditions and less BTA flow rate in CMP processes cannot only reduce the number of Cu voids but also improve the water yield. (c) 2007 Elsevier Ltd. All rights reserved.
InGaN/GaN nanostripe grown on pattern sapphire by metal organic chemical vapor deposition
(2007-01-01)
Ko, T. S.
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Wang, T. C.
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Gao, R. C.
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Lee, Y. J.
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Lu, T. C.
The authors have used metal organic chemical vapor deposition to grow InGaN/GaN multiple quantum well (MQW) nanostripes on trapezoidally patterned c-plane sapphire substrates. Transmission electron microscopy (TEM) images clearly revealed that the MQWs grew not only on the top faces of the trapezoids but also on both lateral side facets along the [0001] direction defined by the selected area electron diffraction pattern. Meanwhile, dislocations that stretched from the interfaces between the GaN and the substrates did not pass through the MQWs in the TEM observation. Microphotoluminescence measurements verified that the luminescence efficiency from a single nanostripe was enhanced by up to fivefold relative to those of regular thin film MQW structures. Observation of the cathodoluminescence identified the areas of light emission and confirmed that enhanced emission occurred from the nanostripes. (c) 2007 American Institute of Physics.
Observations on surface morphologies and dislocations of a-plane GaN grown by metal organic chemical vapor deposition
(2007)
Ko, T. S.
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Wang, T. C.
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Chen, H. G.
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Gao, R. C.
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Huang, G. S.
In this study, we grew non-polar a-plane GaN thin films on r-plane sapphire using a series of growth conditions by metal-organic chemical vapor deposition. The results showed that high temperature and low-pressure conditions benefited two-dimension growth could lead to a fully coalesced a-plane GaN layer with a very smooth surface. The best surface morphology with an excellent mean roughness of 10.5 angstrom was obtained. The different thickness AlN as a nucleation layer and the different delta/beta ratio were also considered. The results revealed that the surface morphology would get worse when the thickness of nucleation layer and delta/beta ratio were away from the values of optimal condition. The observation of transmission electronic microscopy shown the lowest density of threading dislocations was 1.85x10(10) /cm(2). (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Optical characteristics of a-plane InGaN/GaN multiple quantum wells with different well widths
(2007-04-30)
Ko, T. S.
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Lu, T. C.
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Wang, T. C.
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Lo, M. H.
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Chen, J. R.
a-plane InGaN/GaN multiple quantum wells of different widths ranging from 3 to 12 nm were grown on r-plane sapphire by metal organic chemical vapor deposition for investigation. The peak emission intensity of the photoluminescence (PL) reveals a decreasing trend as the well width increases from 3 to 12 nm. Low temperature (9 K) time-resolved PL study shows that the sample with 3-nm-thick wells has a better optical property with a fast exciton decay time of 0.57 ns. The results of cathodoluminescence and micro-PL scanning images for samples of different well widths further verify the more uniform and stronger luminescence intensity distribution observed for the samples of thinner quantum wells, indicating that the important growth parameters for a-plane InGaN/GaN multiple quantum wells could be dominated by the In fluctuation and crystal quality during the epitaxial growth. (c) 2007 American Institute of Physics.
Optical properties of a-plane InGaN/GaN multiple quantum wells on r-plane sapphire substrates with different indium compositions
(2009-03-15)
Chiu, C. H.
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Kuo, S. Y.
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Lo, M. H.
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Ke, C. C.
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Wang, T. C.
A-plane In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.3) multiple-quantum-wells (MQWs) samples, with a well width of about 4.5 nm, were achieved by utilizing r-plane sapphire substrates. Optical quality was investigated by means of photoluminescence (PL), cathodoluminescence, and time resolved PL measurements (TRPL). Two distinguishable emission peaks were examined from the low temperature PL spectra, where the high- and low-energy peaks were ascribed to quantum wells and localized states, respectively. Due to an increase in the localized energy states and absence of quantum confined Stark effect, the quantum efficiency was increased with increasing indium composition up to 24%. As the indium composition reached 30%, however, pronounced deterioration in luminescence efficiency was observed. The phenomenon could be attributed to the high defect densities in the MQWs resulted from the increased accumulation of strain between the InGaN well and GaN barrier. This argument was verified from the much shorter carrier lifetime at 15 K and smaller activation energy for In(0.3)Ga(0.7)N/GaN MQWs. In addition, the polarization-dependent PL revealed that the degree of polarization decreased with increasing indium compositions because of the enhancement of zero-dimensional nature of the localizing centers. Our detailed investigations indicate that the indium content in a-plane InGaN/GaN MQWs not only has an influence on optical performance, but is also important for further application of nitride semiconductors.
Optical study of a-plane InGaN/GaN multiple quantum wells with different well widths grown by metal-organic chemical vapor deposition
(2008-11-01)
Ko, T. S.
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Lu, T. C.
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Wang, T. C.
;
Chen, J. R.
;
Gao, R. C.
a-plane InGaN/GaN multiple quantum wells of different widths ranging from 3 to 12 nm grown on r-plane sapphire by metal-organic chemical vapor deposition were investigated. The peak emission intensity of the photoluminescence (PL) reveals a decreasing trend as the well width increases from 3 to 12 nm. Low temperature (9 K) time-resolved PL (TRPL) study shows that the sample with 3-nm-thick wells has the best optical property with a fastest exciton decay time of 0.57 ns. The results of cathodoluminescence and micro-PL scanning images for samples of different well widths further verify that the more uniform and stronger luminescence intensity distribution are observed for the samples of thinner quantum wells. In addition, more effective capturing of excitons due to larger localization energy E(loc) and shorter radiative lifetime of localized excitons are observed in thinner well width samples in the temperature dependent TRPL. (c) 2008 American Institute of Physics. [DOI: 10.1063/1.3013435]
Optically modulated internal strain in InGaN quantum dots grown on SiNx nano masks
(2008-01-21)
Chang, H. J.
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Chen, T. T.
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Huang, L. L.
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Chen, Y. F.
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Tsai, J. Y.
Optically modulated internal strain has been observed in InGaN quantum dots (QDs) deposited on SiNx nano masks. The modulated internal strain can induce a number of intriguing effects, including the change of refractive index and the redshift of InGaN A(1)(LO) phonon. The underlying mechanism can be well accounted for in terms of the variation of internal strain through the converse piezoelectric effect arising from the screening of the internal electric field due to spatial separation of photoexcited electrons and holes. Our results point out a convenient way for the fine tuning of physical properties in nitride-based semiconductor nanostructures, which is very important for high quality optoelectronic devices. (c) 2006 Optical Society of America.
Study on optimal growth conditions of a-plane GaN grown on r-plane sapphire by metal-organic chemical vapor deposition
(2007-03-15)
Ko, T. S.
;
Wang, T. C.
;
Gao, R. C.
;
Chen, H. G.
;
Huang, G. S.
Non-polar a-plane (1 1 (2) over bar 0) GaN thin films were grown on r-plane (1 (1) over bar 0 2) sapphire substrates by metal-organic chemical vapor deposition. In order to obtain a-plane GaN films with better crystal quality and surface morphology, detailed comparisons between different growth conditions were investigated. The results showed that high-temperature and low-pressure conditions facilitating two-dimensional growth could lead to a fully coalesced a-plane GaN layer with a very smooth surface. The best mean roughness of the surface morphology was 10.5 angstrom. Various thickness values of AlN nucleation layers and the V/III ratios for growth of the a-plane GaN bulk were also studied to determine the best condition for obtaining a smooth surface morphology of the a-plane GaN layer. (c) 2007 Elsevier B.V. All rights reserved.