Browsing by Author "Wong, H-S Philip"

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Challenges and Opportunities toward Online Training Acceleration using RRAM-based Hardware Neural Network
(2017-01-01)
Chang, Chih-Cheng
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Liu, Jen-Chieh
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Shen, Yu-Lin
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Chou, Teyuh
;
Chen, Pin-Chun
This paper highlights the feasible routes of using resistive memory (RRAM) for accelerating online training of deep neural networks (DNNs). A high degree of asymmetric nonlinearity in analog RRAMs could be tolerated when weight update algorithms are optimized with reduced training noise. Hybrid-weight Net (HW-Net), a modified multilayer perceptron (MLP) algorithm that utilizes hybrid internal analog and external binary weights is also proposed. Highly accurate online training could be realized using simple binary RRAMs that have already been widely developed as digital memory.
Demonstration of 40-nm Channel Length Top-Gate p-MOSFET of WS2 Channel Directly Grown on SiOx/Si Substrates Using Area-Selective CVD Technology
(2019-12-01)
Chung, Yun-Yan
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Lu, Kuan-Cheng
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Cheng, Chao-Ching
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Li, Ming-Yang
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Lin, Chao-Ting
For high-volume manufacturing of 2-D transistors, area-selective chemical reaction deposition (CVD) growth is able to provide good-quality 2-D layers and may be more effective than exfoliation from bulk crystals or wet/dry transfer of large-area as-grown 2-D layers. We have successfully grown continuous and uniform WS2 film comprising around seven layers by area-selective CVD approach using patterned tungsten source/drain metals as the seeds. The growth mechanism is inferred and supported by the transmission electron microscope (TEM) images, as well. The first top-gate MOSFETs of CVD-WS2 channels on SiOx/Si substrates are demonstrated to have good short channel electrical characteristics: ON-/OFF-ratio of 10(6), a subthreshold swing of 97 mV/decade, and nearly zero drain-induced barrier lowering (DIBL).
First demonstration of 40-nm channel length top-gate WS2 pFET using channel area-selective CVD growth directly on SiOx/Si substrate
(2019-01-01)
Cheng, Chao-Ching
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Chung, Yun-Yan
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Li, Ming-Yang
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Lin, Chao-Ting
;
Li, Chi-Feng
Area-selective channel material growth for 2D transistors is more desirable for volume manufacturing than exfoliation or wet/dry transfer after large area growth. We demonstrate the first top-gate WS(2)p-channel field-effect transistors (p-FETs) fabricated on SiOx/Si substrate using channel area-selective CVD growth. Smooth and uniform WS2 comprising approximately 6 layers was formed by area-selective CVD growth in which a patterned tungsten-source/drain served as the seed for WS2 growth. For a 40 nm gate length transistor, the device has impressive electrical characteristics: on/off ratio of similar to 10(6), a S.S. of similar to 97 mV/dec.. and nearly zero DIBL.
Recommended Methods to Study Resistive Switching Devices
(2019-01-01)
Lanza, Mario
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Wong, H-S Philip
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Pop, Eric
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Ielmini, Daniele
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Strukov, Dimitri
Resistive switching (RS) is an interesting property shown by some materials systems that, especially during the last decade, has gained a lot of interest for the fabrication of electronic devices, with electronic nonvolatile memories being those that have received the most attention. The presence and quality of the RS phenomenon in a materials system can be studied using different prototype cells, performing different experiments, displaying different figures of merit, and developing different computational analyses. Therefore, the real usefulness and impact of the findings presented in each study for the RS technology will be also different. This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained. The idea is to help the scientific community to evaluate the real usefulness and impact of an RS study for the development of RS technology.