Browsing by Author "Wong, Yuan-Yee"
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Item type:Item, A rapid responding ultraviolet sensor based on multi-parallel aligned ZnO nanowires field effect transistor(2017-06-15) ;Tiong, Teck-Yaw ;Dee, Chang-Fu ;Hamzah, Azrul Azlan ;Goh, Boon TongWong, Yuan-YeeOne-dimensional zinc oxide nanowires (ZnO NWs) have been reported to be suitable for UV sensing, but their applications are limited due to restricted surface area which restrains the performance especially in term of response and recovery. In this paper, we fabricate a UV sensor using multi-parallel aligned ZnO NWs based FET in order to overcome the mentioned drawbacks. The sensing characteristics of multi parallel aligned ZnO NWs based FET toward 0.44 mW/cm(2) UV illumination has been examined under depletion and enhancement modes, at ambient conditions. The fabricated UV sensor was found to possess the ability to differentiate UV with different intensity, improved sensitivity (in depletion mode), short response and recovery time (< 1 s), and with high stability. Our paper reports a simple and effective approach for UV sensor fabrication with high responsivity, sensitivity and reproducibility. (C) 2017 Elsevier B.V. All rights reserved.Item type:Item, Investigation of TMAl preflow to the properties of AlN and GaN film grown on Si(111) by MOCVD(2014-01-01) ;Lumbantoruan, Franky ;Wong, Yuan-Yee ;Wu, Yue-Han ;Huang, Wei-ChingShrestra, Niraj ManThe influence of TMAl preflow to the AlN buffer layer and GaN thin film was studied by Optical Microscope, Atomic Force Microscope, X-ray diffraction and Transmission Electron Microscope. Different duration of TMAl preflow lead to substantially differences of the AlN buffer layer and GaN film properties in terms of surface morphology and crystal quality. It was found without TMAl preflow the crystal quality of AlN buffer layer and GaN deteriorated due to the formation of amorphous interlayer between Si and AlN. Meltback etching and cracks was observed on the surface of GaN grown on AlN without TMAl preflow. However, overlong duration of TMAl preflow degraded the properties of AlN buffer layer and the subsequent GaN layer. GaN grown with longer TMAl preflow suffer of poor crystal quality, high density cracks and rough surface morphology. With the optimum duration of TMAl preflow, crystal quality and surface roughness of GaN can be improved.Item type:Item, The growth of pine-leaf-like hierarchical SnO2 nanostructures(2014-01-01) ;Dee, Chang Fu ;Tiong, Teck Yaw ;Varghese, Binni ;Sow, Chorng-HaurWong, Yuan-YeePine-leaf-like SnO2 hierarchical nanostructures (NSs) were grown by a two-step vapour transport deposition process with a combination of vapour-solid and vapour-liquid-solid mechanisms at the primary and secondary processes, respectively. This type of hierarchical structure consisted of SnO2 trunk with homo-branching nanowires (NWs). The branched NWs connected the trunk NWs at included angles of 56 degrees and 90 degrees for two different types of hierarchical NSs. Based on the thermodynamic calculation, the formation of branched NWs at those angles are all energetically favourable.Item type:Item, The growth of pine-leaf-like hierarchical SnO2 nanostructures(2014-01-01) ;Dee, Chang Fu ;Tiong, Teck Yaw ;Varghese, Binni ;Sow, Chorng-HaurWong, Yuan-YeePine-leaf-like SnO2 hierarchical nanostructures (NSs) were grown by a two-step vapour transport deposition process with a combination of vapour-solid and vapour-liquid-solid mechanisms at the primary and secondary processes, respectively. This type of hierarchical structure consisted of SnO2 trunk with homo-branching nanowires (NWs). The branched NWs connected the trunk NWs at included angles of 56 degrees and 90 degrees for two different types of hierarchical NSs. Based on the thermodynamic calculation, the formation of branched NWs at those angles are all energetically favourable.