Browsing by Author "Wu, H. Y."
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Item type:Item, Fabrication of High Electrical Performance NILC-TFTs Using FSG Buffer Layer(2010) ;Chen, C. C. ;Wu, Y. C. ;Tung, T. F. ;Wu, H. Y.材料科學與工程學系Fluorinated-silicate-glass (FSG) was combined with Ni-metal-induced lateral crystallization (NILC) polycrystalline silicon thin-film transistors (poly-Si TFTs). It was found that the electrical performances were improved because the trap-state density was decreased by fluorine-ion passivation. Moreover, FSG-NILC-TFTs possess high immunity against the hot-carrier stress and, thereby, exhibit better reliability.