Browsing by Author "Wu, J"

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A modified multi-chemical spray cleaning process for post shallow trench isolation chemical mechanical polishing cleaning application
(1998-11-02)
Wang, YL
;
Wang, TC
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Wu, J
;
Tseng, WT
;
Lin, CF
Chemical mechanical planarization (CMP) has become widely accepted for the formation of device interconnect structures. Shallow trench isolation technology (STI) utilizes CMP and has been applied to deep-sub-micron processes. Poly Si, CVD Si or SiO2 can be grown or deposited in the trench and planarized by a CMP process. However, the typical wafer surface is contaminated with slurry particles and metallic impurities after the CMP process. The silica particles may damage the VLSI patterns and the metallic impurities can induce many crystal defects in Si wafers during the following furnace processing. Therefore, the post CMP clean is a very important step for the STI process. However, the wafer for poly-Si surface is hydrophobic, SiO2 surface is hydrophilic and Si film is very easy to charge up. Thus, the defect can be difficult to remove by a conventional cleaning technique. In this study: we propose the use of a modified multi-chemicals spray cleaning process for post STI CMP cleaning. We used a modified and heated ammonia/peroxide mix (APM) clean with an ammonia pre-soak and an HF step to etch a thin layer for the removal of trapped metallic ions which can be followed by a hydrochloric/peroxide mix (HPM) clean process to assist in the removal of metallic ions. (C) 1998 Elsevier Science S.A. All rights reserved.
An XCS-based intelligent searching model for cross-organization identity management in web service
(2004)
Lo, CC
;
Lin, WL
;
Wu, J
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資訊管理與財務金融系註：原資管所+財金所
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Department of Information Management and Finance
Internet services in distributive organization are normally built on an open network environment. In the environment internet service provisioning cannot be expected executing in a single close organization [1]. Identity management in cross-organization becomes an issue for handling Internet service and distributive business process. The "identity" in cross-organization web service is defined as global identity rather than private identity from client. Global identity searching; table that registers all related service organization is the normal way we used to [2]. Through global identity searching table the target service organization can be looked up directly. For some business program, however, global identity is not necessary registered in specific service organization, e.g. IMSI (International Mobile Subscriber Identification) registration in NP (Number Portability) Service [3], for instance. In NP Service each IMSI can be re-assigned to different mobile service provider if the IMSI apply the re-assigmnent. In the example about IMSI in NP service mentioned above, if there is an internet service will be executed according to identity management with IMSI, then it will be a challenge to find the organization for available IMSI in very short response time. To dynamically re-assign a IMSI in different mobile service provider, the traditional global identity searching table will not be practical due to frequently changing the registration of IMSI in different service provider. To give an intelligent searching model for cross-organization global identity management is a better way than a static global identity searching table management in Web service. In this article the XCS (eXtended Classifier System) classifier system [4] will be proposed as the kernel system. With the characteristics in machine learning and rules management, the XCS-based intelligent searching model can help to predict where the web service can find the global identity in the open and cross-organization environment.
Precipitates formation and its impact on the structure of plasma-deposited fluorinated silicon oxide films
(2006-02-24)
Wu, J
;
Wang, YL
;
Kuo, CT
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材料科學與工程學系
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Department of Materials Science and Engineering
Fluorine-doped silicon oxide (SiOF) films prepared by plasma enhanced chemical vapor deposition would generate precipitates on the film surface during exposure to air. The chemical and structural changes of SiOF films during the precipitation process were investigated under various fluorine-doping concentrations in SiOF films. Film composition depth profiles characterized by secondary ion mass spectrometer (SIMS) indicate uneven fluorine distribution within SiOF film after precipitation. During the precipitation process, the Fourier transform infrared (FTIR) spectra of SiOF films showed the decreasing trend in the intensities of Si-F-n (n = 1, 2...) bonding peak, whereas an opposing trend in Si-OH bonding as well as the shoulder peak of Si-O stretching mode were observed. Moreover, the formation of the precipitates lead to lower refractive index, a relief in compressive residual stress, and higher wet etch rate of SiOF films. The structural changes of SiOF films due to the formation of precipitates were extensively discussed. (c) 2005 Elsevier B.V. All rights reserved.
Study on precipitations of fluorine-doped silicon oxide
(2004-01-30)
Wu, J
;
Wang, YL
;
Liu, CP
;
Chang, SC
;
Kuo, CT
Precipitation on fluorine-doped silicon oxide film (SiOF) was observed while exposure to air for a prolonged period of time (>4 h). Most of the precipitates are less than 1 mum and clustered at wafer center. Under SEM view, the precipitation shows hexagonal shape, and mainly composed of Si and O. SIMS analysis showed that SiOF films without F precipitates showed leveling F% profile, whereas SIMS result for SiOF films with precipitations shows increasing gradient with depth. In this study, factors affecting the precipitation of SiOF film were investigated. Humidity in environment was found to be one of the essential elements for the onset of precipitation. Process optimization and control methodologies were also investigated for precipitation prevention to provide a more robust and stable SiOF film, hence ensuring the reliability of device performance. (C) 2003 Elsevier B.V. All rights reserved.