Browsing by Author "Xuan, Rong"

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Effect of AlInGaN barrier layers with various TMGa flows on optoelectronic characteristics of near UV light-emitting diodes grown by atmospheric pressure metalorganic vapor phase epitaxy
(2011-08-01)
Fu, Yi-Keng
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Lu, Yu-Hsuan
;
Jiang, Ren-Hao
;
Chen, Bo-Chun
;
Fang, Yen-Hsiang
Near ultraviolet light-emitting diodes (LEDs) with quaternary AlInGaN quantum barriers (QBs) are grown by atmospheric pressure metalorganic vapor phase epitaxy. The indium mole fraction of AlInGaN QB could be enhanced as we increased the TMG flow rate. Both the wavelength shift in EL spectra and forward voltage at 20 mA current injection were reduced by using AlInGaN QB. Under 100 mA current injection, the LED output power with Al(0.089)In(0.035)Ga(0.876)N QB can be enhanced by 15.9%, compared to LED with GaN QB. It should be attributed to a reduction of lattice mismatch induced polarization mismatch in the active layer. Crown Copyright (C) 2011 Published by Elsevier Ltd. All rights reserved.
Enhancing threshold voltage of AlGaN/GaN high electron mobility transistors by nano rod structure: From depletion mode to enhancement mode
(2012-09-10)
Xuan, Rong
;
Kuo, Wei-Hong
;
Hu, Chih-Wei
;
Lin, Suh-Fang
;
Chen, Jenn-Fang
This paper presents an approach in fabricating normally off AlGaN/GaN high electron mobility transistors (HEMTs). The fabrication technique was based on the carbon-doped GaN epitaxy layers on silicon substrate and the nano rod structure of the gate region in AlGaN/GaN HEMTs. Using this method, the threshold voltage of AlGaN/GaN HEMTs can be shifted from -2 V in a conventional depletion-mode (D-mode) AlGaN/GaN HEMT to 2 V in an enhancement-mode (E-mode) AlGaN/GaN HEMT. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4752113]
High efficiency and output power of near-ultraviolet light-emitting diodes grown on GaN substrate with back-side etching
(2012-04-01)
Fang, Yen-Hsiang
;
Fu, Yi-Keng
;
Xuan, Rong
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電子物理學系
;
Department of Electrophysics
In this paper, we investigate the differences between optical and electrical properties of near-ultraviolet (NUV) InGaN/GaN multi-quantum well light-emitting diodes (LEDs) grown on GaN substrate with a roughened back-side on the N-face surface of GaN substrate through a chemical wet-etching process, and on pattern sapphire substrate (PSS). Back-side etching-treated NUV-LEDs have larger output power than conventional NUV-LEDs, NUV-LEDs with wider wells and NUV-LEDs grown on PSS. When the NUV-LEDs were operated at a forward current of 20 mA, the output power of back-side etching-treated NUV-LEDs was improved by approximately 100, 106 and 8% compared with that of conventional NUV-LEDs, NUV-LEDs with wider wells and NUV-LEDs grown on PSS, respectively. This larger enhancement results from the improved light extraction that was attributed to the different transmittance because a hexagonal pyramid on the N-face GaN that was etched formed at the stable crystallographic etching planes of the GaN {1011} planes.
Hole Injection and Electron Overflow Improvement in 365 nm Light-Emitting Diodes by Band-Engineering Electron Blocking Layer
(2013-08-01)
Fu, Yi-Keng
;
Lu, Yu-Hsuan
;
Xuan, Rong
;
Chen, Jenn-Fang
;
Su, Yan-Kuin
The work reports a theoretical and experimental study on the device performance of near ultraviolet light-emitting diodes (LEDs) with specific design on the electron blocking layer (EBL) by employing the band-engineering. The simulation results show the polarization-induced downward band bending is mitigated in the specific EBL design and, hence, the capability of hole transportation increases and the behavior of electron overflow decreases. The experimental results show the LEDs with specific EBL design exhibited a reduction of forward voltage from 4.40 to 4.07 V and a much enhancement of light output power from 30.6 to 51.9mW, compared with conventional LED. (C) 2013 The Japan Society of Applied Physics
Optical Simulation and Fabrication of Near-Ultraviolet LEDs on a Roughened Backside GaN Substrate
(2012-03-15)
Fu, Yi-Keng
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Lu, Yu-Hsuan
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Xuan, Rong
;
Chao, Chia-Hsin
;
Su, Yan-Kuin
In this letter, the numerical and experimental demonstrations for enhancement of light extraction efficiency in near-ultraviolet light-emitting diodes (LEDs) with a roughened backside on the N-face surface of GaN substrate through a chemical wet-etching process are investigated. It was also found that the increased etching time can increase the height of hexagonal pyramids and decrease the density of hexagonal pyramids. With 20-mA injection current, it was found that forward voltages were 3.13 and 3.16 V while output powers were 13.15 and 27.18 mW for the conventional LED and roughened backside LED, respectively.
P-substrate small-aperture holey light-emitting diodes for fiber-optic applications
(2007)
Yang, Hung-Pin D.
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Liu, Jui-Nung
;
Lai, Fang-, I
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Kuo, Hao-Chung
;
Xuan, Rong
An oxide-confined holey light-emitting diode (LED) on p-type GaAs substrate in the 830 nm range is reported. The device is consisted of bottom DBR, quantum wells, and top DBR, with a holey structure for light extraction. The internally reflected spontaneous emission can be extracted out of the etched hole.
Reduction of Efficiency Droop in InGaN Light-Emitting Diode Grown on Self-Separated Freestanding GaN Substrates
(2011-06-15)
Chao, Chu-Li
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Xuan, Rong
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Yen, Hsi-Hsuan
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Chiu, Ching-Hsueh
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Fang, Yen-Hsiang
Using a GaN nanorod template in a hydride vapor phase epitaxy (HVPE) system can manufacture a freestanding GaN (FS-GaN) substrate with threading dislocation densities down to similar to 10(7) cm(-2). In this letter, we report InGaN/GaN multiple-quantum-well light-emitting diodes (LEDs) grown on this FS-GaN substrate. The defect densities in the homoepitaxially grown LEDs were substantially reduced, leading to improved light emission efficiency. Compared with the LED grown on sapphire, we obtained a lower forward voltage, smaller diode ideality factor, and higher light-output power in the same structure grown on FS-GaN. The external quantum efficiency (EQE) of LEDs grown on FS-GaN were improved especially at high injection current, which brought the efficiency droop phenomenon greatly reduced at high current density.
Study of InGaN-Based Light-Emitting Diodes on a Roughened Backside GaN Substrate by a Chemical Wet-Etching Process
(2011-10-01)
Fu, Yi-Keng
;
Chen, Bo-Chun
;
Fang, Yen-Hsiang
;
Jiang, Ren-Hao
;
Lu, Yu-Hsuan
The InGaN-based light-emitting diodes (LEDs) with a roughened backside on the N-face surface of GaN substrate were fabricated through a chemical wet-etching process to increase light-extraction efficiency. The stable crystallographic etching planes were formed as the GaN {10 (11) over bar} planes. When the near-ultraviolet and blue LED were operated as a forward current of 20 mA, the output power of LEDs was improved from 13.2 and 19.9 mW to 25.6 and 24.0 mW, respectively. The different enhanced ratio is attributed to the different transmittance as a function of wavelength is caused from hexagonal pyramid on N-face GaN substrate after wet-etching process.
The effect of trimethylgallium flows in the AIInGaN barrier on optoelectronic characteristics of near ultraviolet light-emitting diodes grown by atmospheric pressure metalorganic vapor phase epitaxy
(2011-03-21)
Fu, Yi-Keng
;
Jiang, Ren-Hao
;
Lu, Yu-Hsuan
;
Chen, Bo-Chun
;
Xuan, Rong
The letter reports a theoretical and experimental study on the device performance of near ultraviolet light-emitting diodes (LEDs) with quaternary AlInGaN quantum barrier (QB). The indium mole fraction of AlInGaN QB could be enhanced as we increased the trimethylgallium flow rate. It was found the AlInGaN/InGaN LEDs can reduce forward voltage and improve light output power, compared with conventional GaN QB. By using advanced device simulation, it should be attributed to a reduction in lattice mismatch induced polarization mismatch in the active layer, which results in the suppression of electron overflow. (C) 2011 American Institute of Physics. [doi:10.1063/1.3571440]
The Fabrication of Laser Array by Holographic Interference Lithography
(2007)
Chao, Chuli
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Ni, Chi-Yu
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Xuan, Rong
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Kuo, Hao-Chung
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電子物理學系
We have developed a novel method to produce different grating periods in one chip and applied this in the fabrication for laser array. The result shows accurate controllability of lasing wavelength and low threshold currents. (C) 2007 Optical Society of America