Browsing by Author "Yang, T. N."

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Improvement of luminescence from Si nanocrystals with thermal annealing in CO2
(2008-01-15)
Yang, M. D.
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Chu, A. H. M.
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Shen, J. L.
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Huang, Y. H.
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Yang, T. N.
Photoluminescence (PL) of Si nanocrystals with annealing in CO2 was studied using the continuous and time-resolved PL measurements. The PL intensity enhances as annealing temperature increases, which is attributed to passivation of the nonradiative recombination centers. As the annealing temperature is 950 degrees C the PL intensity has a maximum value, which increases about a factor of 3 than that of the untreated sample. Based on the emission energy dependence of the PL decay time, the depth of carrier localization is found to increase after the annealing in CO2. We suggest that the oxygen atoms desorbed from CO2 diffuse to react with Si nanocrystals and introduce localized states at the Si/SiO2 interface. (C) 2007 Elsevier B.V. All rights reserved.
Investigation of arsenic-doped ZnO thin films grown on Si substrate by atmospheric-pressure metal-organic chemical vapor deposition
(2012-06-01)
Hung, S. C.
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Wang, K. J.
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Lan, S. M.
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Yang, T. N.
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Uen, W. Y.
Zinc oxide (ZnO) thin film was grown on semi-insulating Si substrate using arsine (AsH3) as precursor by atmospheric-pressure metal-organic chemical vapor deposition (AP-MOCVD). In recently reported results, the physical mechanisms for As-doped ZnO thin films are explained as As substitution for oxygen (AsO) or As substitution for Zn and As combined with two Zn vacancies (AsZn2VZn). In this study, we control the in situ annealing ambient into two environments with various temperatures, which are Zn-rich, using diethylzinc (DEZn) as ambient gas, and O-rich, using water vapor as ambient gas, respectively. This should help to create AsO and AsZn2VZn. The ZnO thin film after in situ thermal annealing with H2O vapor ambient at 550 and 750 degrees C show p-type conductivity with hole concentration of 2.651 x 10(17) and 1.782 x 10(18)?cm-3, Hall mobilities of 10.08 and 5.402?cm2/V?s, and resistivities of 2.368 and 0.6485?O?cm, respectively.
Morphology and optical properties of zinc oxide thin films grown on Si (100) by metal-organic chemical vapor deposition
(2009-01-01)
Lan, S. M.
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Uen, W. Y.
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Chan, C. E.
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Chang, K. J.
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Hung, S. C.
Undoped zinc oxide (ZnO) thin films were deposited on Si (100) substrates by atmospheric pressure metal-organic chemical vapor deposition (AP-MOCVD). After a nucleation layer of ZnO about 500 A... was deposited, top ZnO films with 320-440 nm in thickness were fabricated at temperatures varying from 450 to 600 A degrees C, respectively. X-ray diffraction analyses demonstrate that all the films grown have polycrystalline wurtzite structure. Scanning electron microscopy observations indicate that ZnO films grow with c-axis aligned grains when the deposition temperature is lower than 600 A degrees C. However, 3D microstructures without c-axis alignment were found when the film was deposited at 600 A degrees C. Room temperature photoluminescence (PL) spectra peaking at 3.27-3.29 eV were observed for the ZnO films grown at 450-600 A degrees C. However, only the spectrum from the film grown at 600 A degrees C could present a high intensity ratio of the ultraviolet band to deep-level emissions, which is above 392 and show a minimum full-width at half-maximum of 99 meV for the ultraviolet band. Temperature-dependent PL measurements from 20 to 300 K exhibited the luminescent mechanism of the present ZnO films to be near band excitonic emission.
Optical studies of InN epilayers on Si substrates with different buffer layers
(2007-12-01)
Yang, M. D.
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Shen, J. L.
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Chen, M. C.
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Chiang, C. C.
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Lan, S. M.
We have investigated the photoluminescence (PL) and time-resolved PL from the InN epilayers grown on Si substrates with different buffer layers. The narrowest value of the full width at half maximum of the PL peak is 52 meV with the AlN/AlGaN/GaN triple buffer layer, which is better than previous reports on similar InN epilayers on Si substrates. Based on the emission-energy dependence of the PL decays, the localization energy of carriers is also the least for the InN with a triple buffer layer. According to the x-ray diffraction measurements, we suggest that the reduced lattice mismatch between the InN epilayer and the top buffer layer is responsible for improvement of sample quality using the buffer-layer technique. (c) 2007 American Institute of Physics.
Photoluminescence studies of InAs/GaAs quantum dots covered by InGaAs layers
(2010-01-15)
Shu, G. W.
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Wang, J. S.
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Shen, J. L.
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Hsiao, R. S.
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Chen, J. F.
Photoluminescence (PL), PL excitation (PLE), and time-resolved PL were used to study effects of InGaAs layers on the optical properties of InAs/GaAs quantum dots (QDs). A rich fine structure in the excited states of confined excitons (up to n = 4 quantum states) was observed, providing useful information to study the quantum states in the InAs/GaAs QDs. A significant redshift of the PL peak energy for the QDs covered by InGaAs layers was observed, attributing to the decrease of the QD strain and the lowing of the quantum confinement. (C) 2009 Elsevier B.V. All rights reserved.