Browsing by Author "Yeh, Y. H."

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Nickel silicide nanocrystals embedded in SiO2 and HfO2 for nonvolatile memory application
(2007-12-03)
Yang, F. M.
;
Chang, T. C.
;
Liu, Po-Tsun
;
Yeh, Y. H.
;
Yu, Y. C.
In this study, a nonvolatile memory device with NiSi2 nanocrystals embedded in the SiO2 and HfO2 layer has been fabricated. A significant memory effect is observed during the characterization of the electrical properties. When a low operating voltage, 4 V, is applied, a significant threshold voltage shift of 1.3 V, is observed. The processing of this structure is compatible with the current manufacturing technology of semiconductor industry. (C) 2007 Published by Elsevier B.V.