Browsing by Author "Zhang, XX"

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Electronic transport studies on Sb1-x(SiO2)(x) films
(2005-05-04)
Du, J
;
Li, ZQ
;
Lin, JJ
;
Liu, H
;
Zheng, RK
Sb1-x(SiO2)(x) granular films were prepared by the co-sputtering method with the volume fraction of SiO2, x, ranging from 0 (i.e. pure Sb) to about 30 %. Systematic electronic transport studies, including resistivity, magnetoresistance, Hall effect and Seebeck effect, were carried out against the temperature, magnetic field and volume fraction x of SiO2. With the gradual increase of the SiO2 content, the mean grain size of the Sb decreases, and eventually the film becomes amorphous, as illustrated by the changes of the x-ray diffraction patterns. The temperature coefficient of resistivity also changes its sign from positive to negative, indicating a semimetal-semiconductor or insulator transition. Magnetoresistance studies using the weak localization theory revealed that the electron dephasing time follows approximately a T-2 law. This behaviour indicates that the electron-phonon (e-ph) scattering still dominates the electron dephasing processes in these granular systems with a fair number of SiO2 inclusions. The Hall coefficient decreases monotonically with temperature and with the volume fraction of SiO2. The giant Hall effect is absent in these granular films. Finally, an interesting but rather complicated behaviour of the Seebeck coefficient versus temperature was observed when the volume content of the SiO2 exceeded 18 %.
Giant Hall effect in nonmagnetic granular metal films
(2001-06-11)
Zhang, XX
;
Wan, CC
;
Liu, H
;
Li, ZQ
;
Sheng, P
Nearly 3 orders of magnitude enhancement in the Hall coefficient is observed in Cu-x -(SiO2)(1-x) granular films. This large enhancement of the Hall coefficient not only is significantly larger than the prediction of the classical percolation theory, but also occurs at a metal concentration identified to be the quantum percolation threshold. Measurements of the electron dephasing length and magnetoresistance, plus the TEM characterization of microstructures, yield a physical picture consistent with the mechanism of the local quantum interference effect.
Low temperature electrical transport properties of RuO2 and IrO2 single crystals
(2004-11-17)
Lin, JJ
;
Huang, SM
;
Lin, YH
;
Lee, TC
;
Liu, H
We have systematically measured the electrical transport properties of several RuO2 and IrO2 single crystals over a wide temperature range from 300 K down to 0.3 K to study the conduction mechanisms in these oxides. Our measured resistivities are in close agreement with the recent band-theory calculations for these materials. The characteristic temperatures for the acoustic-mode and optical-mode phonons are determined. Our measured magnetoresistances are positive and follow the Kohler rule, indicating that the transport properties of these oxides exhibit normal behaviour as described by the Boltzmann equation. In contrast, we do not find any signature of superconductivity down to 0.3 K, though the band-theory calculations predict a superconducting transition temperature of similar to5 K. Magnetization measurements suggest a very low level of paramagnetic impurities in our crystals.