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顯示 1 到 11 筆資料，總共 11 筆
公開日期標題作者
三月-2016Bias Temperature Instabilities for High-kappa HfO2 LTPS-TFTs With Dual Plasma TreatmentWu, Chien-Hung; Huang, Bo-Wen; Chang, Kow-Ming; Chang, Ting-Chia; Wang, Shui-Jinn; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2012Electrical Improvement of MIS Capacitor with HfAlOx Gate Dielectrics Treated by Dual Plasma TreatmentDeng, I-Chung; Chang, Kow-Ming; Chang, Ting-Chia; Chang, Po-Chun; Huang, Bo-Wen; Wu, Chien-Hung; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2012Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma TreatmentChang, Kow-Ming; Chang, Ting-Chia; Chang, Po-Chun; Huang, Bo-Wen; Wu, Chien-Hung; Deng, I-Chung; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2016The Investigation for In-Ga-Zn-O TFTs with Post Deposition of in-situ Ar/H-2 Plasma Treatment by Atmospheric Pressure Plasma JetChang, Kow-Ming; Huang, Bo-Wen; Wu, Chien-Hung; Chen, Hsin-Ying; Zheng, You-Xian; Lee, Ming-Chuan; Zhang, Yu-Xin; Lin, Chuang-Ju; Cheng, Yu-Hsuan; Wang, Shui-Jinn; Hsu, Jui-Mei; Lin, Yu-Li; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-三月-2018Investigation of Gate-Stacked In-Ga-Zn-O TFTs with Ga-Zn-O Source/Drain Electrodes by Atmospheric Pressure Plasma-Enhanced Chemical Vapor DepositionWu, Chien-Hung; Chang, Kow-Ming; Chen, Yi-Ming; Huang, Bo-Wen; Zhang, Yu-Xin; Wang, Shui-Jinn; Hsu, Jui-Mei; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2016Investigation of Microwave Assisted Annealing on AP-PECVD Fabricated In-Ga-Zn-O Thin Film Transistors under Positive Bias Temperature StressWu, Chien-Hung; Huang, Bo-Wen; Chang, Kow-Ming; Cheng, Chia-Yao; Chen, Hsin-Ying; Lee, Yao-Jen; Lin, Jian-Hong; Hsu, Jui-Mei; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
六月-2016The Performance Improvement of N-2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO ChannelWu, Chien-Hung; Huang, Bo-Wen; Chang, Kow-Ming; Wang, Shui-Jinn; Lin, Jian-Hong; Hsu, Jui-Mei; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2015Using dual plasma treatment to improve electrical characteristics and reduce flicker noise of high-kappa HfO2 LTPS-TFTsChang, Kow-Ming; Huang, Bo-Wen; Wu, Chien-Hung; Deng, I-Chung; Chang, Ting-Chia; Lin, Sheng-Chia; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-三月-2018Using KrF ELA to Improve Gate-Stacked LaAlO3/ZrO2 Indium Gallium Zinc Oxide Thin-Film Transistors with Novel Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition TechniqueWu, Chien-Hung; Chang, Kow-Ming; Chen, Yi-Ming; Huang, Bo-Wen; Zhang, Yu-Xin; Wang, Shui-Jinn; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2016低溫製程技術處理於低溫多晶矽薄膜電晶體及大氣常壓電漿輔助化學氣相沉積製備銦鎵鋅氧薄膜電晶體之探討黃柏文; 張國明; 吳建宏; Huang, Bo-Wen; Chang, Kow-Ming; Wu, Chien-Hung; 電子工程學系 電子研究所
2011利用四氟化碳電漿處理於多晶矽及氮電漿處理於二氧化鉿閘極介電層之低溫多晶矽薄膜電晶體之研究黃柏文; Huang, Bo-Wen; 張國明; Chang, Kow-Ming; 電子研究所
顯示 1 到 11 筆資料，總共 11 筆