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dc.contributor.author張翼en_US
dc.contributor.author林岳欽en_US
dc.contributor.author王煥中en_US
dc.date.accessioned2015-12-04T07:03:25Z-
dc.date.available2015-12-04T07:03:25Z-
dc.date.issued2015-08-21en_US
dc.identifier.govdocH01L029/78zh_TW
dc.identifier.govdocH01L021/28zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/128760-
dc.description.abstract一種增強型氮化鎵電晶體,包括:一基板;一異質結構,該異質結構在該基板上,其中該異質結構係由Inx Al1-x n/AlN以及AlGaN/GaN群組中所選出;一p型元素磊晶成長層,p型元素磊晶成長層在該異質結構上;一汲極歐姆接觸及一源極歐姆接觸,該汲極歐姆接觸及該源極歐姆接觸在該異質結構且分別設置在該p型元素磊晶成長層之兩側邊;一閘極結構,該閘極結構在該p型元素磊晶成長層上且與該汲極歐姆接觸及該源極歐姆接觸彼此分離;以及一表面鈍化層,該表面鈍化層包覆該汲極歐姆接觸、該源極歐姆接觸、該p型元素磊晶成長層及覆蓋部份該閘極結構。zh_TW
dc.language.isozh_TWen_US
dc.title增強型氮化鎵電晶體及其形成方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI497721zh_TW
Appears in Collections:Patents


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