探討乾式電漿蝕刻對晶圓缺陷的影響

Full metadata record

DC Field	Value	Language
dc.contributor.author	劉嘉群	zh_TW
dc.contributor.author	楊界雄	zh_TW
dc.date.accessioned	2018-01-24T07:35:32Z	-
dc.date.available	2018-01-24T07:35:32Z	-
dc.date.issued	2016	en_US
dc.identifier.uri	http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070358307	en_US
dc.identifier.uri	http://hdl.handle.net/11536/138460	-
dc.language.iso	zh_TW	en_US
dc.subject	蝕刻	zh_TW
dc.subject	晶圓	zh_TW
dc.subject	電漿	zh_TW
dc.subject	Etch	en_US
dc.subject	Wafer	en_US
dc.subject	Plasma	en_US
dc.title	探討乾式電漿蝕刻對晶圓缺陷的影響	zh_TW
dc.title	Investigation of Defects Induced by Plasma Dry Etch Processes	en_US
dc.type	Thesis	en_US
dc.contributor.department	光電科技學程	zh_TW
Appears in Collections:	Thesis