橢圓儀與光譜儀在複晶矽厚度測量上之應用

Full metadata record

DC Field	Value	Language
dc.contributor.author	蘇啟孟	en_US
dc.contributor.author	Su, Qi-Meng	en_US
dc.contributor.author	李崇仁	en_US
dc.contributor.author	任建葳	en_US
dc.contributor.author	Li, Chong-Ren	en_US
dc.contributor.author	Ren, Jian-Wei	en_US
dc.date.accessioned	2014-12-12T02:02:39Z	-
dc.date.available	2014-12-12T02:02:39Z	-
dc.date.issued	1982	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT714428012	en_US
dc.identifier.uri	http://hdl.handle.net/11536/51732	-
dc.description.abstract	本文發展出利用橢圓儀與光儀測量複晶矽厚度的技術。對橢圓儀測量技術而言，利用實驗得到的折射率，藉著計算機可以快地求出複晶矽的厚度與吸收係數。光譜儀測量技術包括，Curve fi-tting與Extrena 兩種方法。四百埃以下的複晶矽，採用Curve fitting 法，其他的厚度，兩種方法都適用，可用以互相比較。	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	橢圓儀	zh_TW
dc.subject	光譜儀	zh_TW
dc.subject	複晶矽	zh_TW
dc.subject	厚度測量	zh_TW
dc.subject	折射率	zh_TW
dc.subject	吸收係數	zh_TW
dc.subject	電子工程	zh_TW
dc.subject	CURVE-FITTING	en_US
dc.subject	EXTREMA	en_US
dc.subject	ELECTRONIC-ENGINEERING	en_US
dc.title	橢圓儀與光譜儀在複晶矽厚度測量上之應用	zh_TW
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis