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dc.contributor.author莊紹勳en_US
dc.contributor.authorChung Steve Sen_US
dc.date.accessioned2014-12-13T10:35:13Z-
dc.date.available2014-12-13T10:35:13Z-
dc.date.issued2000en_US
dc.identifier.govdocNSC89-2218-E009-110zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/93274-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=619835&docId=115468en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject快閃式記憶體zh_TW
dc.subject可靠度zh_TW
dc.subject浮動閘zh_TW
dc.subject資料持久力zh_TW
dc.subject氧化層傷害zh_TW
dc.subjectFrash memoryen_US
dc.subjectReliabilityen_US
dc.subjectFloating gateen_US
dc.subjectData retentionen_US
dc.subjectOxide damageen_US
dc.title不同型摻雜材料浮動閘極快閃式記憶元件可靠性問題之研究zh_TW
dc.titleA Study on the Reliability Issues of Flash EEPROM with Different Floating Gate Materialsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
Appears in Collections:Research Plans


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