Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 潘扶民 | en_US |
dc.contributor.author | PAN FU-MING | en_US |
dc.date.accessioned | 2014-12-13T10:36:56Z | - |
dc.date.available | 2014-12-13T10:36:56Z | - |
dc.date.issued | 1999 | en_US |
dc.identifier.govdoc | NSC88-2215-E317-002 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/94279 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=418270&docId=74205 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 矽晶圓 | zh_TW |
dc.subject | 超洗淨 | zh_TW |
dc.subject | 表面分析 | zh_TW |
dc.subject | 金氧半導體 | zh_TW |
dc.subject | 金屬汙染物 | zh_TW |
dc.subject | 氮化氧化層 | zh_TW |
dc.subject | Silicon wafer | en_US |
dc.subject | Ultra-cleaning | en_US |
dc.subject | Surface analysis | en_US |
dc.subject | MOS | en_US |
dc.subject | Metal contaminant | en_US |
dc.subject | Nitrided oxide | en_US |
dc.title | 矽晶圓高效減廢超洗淨技術研究 | zh_TW |
dc.title | Ultra-clean for Silicon Wafers with Less Consumption of Water and Chemicals | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學毫微米實驗室 | zh_TW |
Appears in Collections: | Research Plans |