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dc.contributor.author潘扶民en_US
dc.contributor.authorPAN FU-MINGen_US
dc.date.accessioned2014-12-13T10:36:56Z-
dc.date.available2014-12-13T10:36:56Z-
dc.date.issued1999en_US
dc.identifier.govdocNSC88-2215-E317-002zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94279-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=418270&docId=74205en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject矽晶圓zh_TW
dc.subject超洗淨zh_TW
dc.subject表面分析zh_TW
dc.subject金氧半導體zh_TW
dc.subject金屬汙染物zh_TW
dc.subject氮化氧化層zh_TW
dc.subjectSilicon waferen_US
dc.subjectUltra-cleaningen_US
dc.subjectSurface analysisen_US
dc.subjectMOSen_US
dc.subjectMetal contaminanten_US
dc.subjectNitrided oxideen_US
dc.title矽晶圓高效減廢超洗淨技術研究zh_TW
dc.titleUltra-clean for Silicon Wafers with Less Consumption of Water and Chemicalsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學毫微米實驗室zh_TW
Appears in Collections:Research Plans