INSITU GROWTH OF SUPERCONDUCTING YBA2CU3O7-X THIN-FILMS

Abstract

Using single-target on-axis sputter deposition, YBa2Cu3O7-x films, with flatness oriented in the c axis and a zero-resistance temperature (T(co)) of 89 K, were prepared by an in situ growth technique. This work examines the effect of the growth temperature on the properties of in situ films. The experimental results show that high-quality YBa2Cu3O7-x films can be obtained by controlling the substrate temperature in a range from 680-degrees to 690-degrees-C. In addition, a new parallel-circuit model is proposed and a simulation of the resistance versus temperature curve is presented.