Micro-Wave Propagation in Magneto-Plasma

dc.citation.epage8en_US
dc.citation.issue1en_US
dc.citation.spage1en_US
dc.citation.volume3en_US
dc.contributor.author陳榮淦zh_TW
dc.contributor.author孟光森zh_TW
dc.contributor.author謝明憲zh_TW
dc.contributor.authorY.G.Chenen_US
dc.contributor.authorK.S.Mengen_US
dc.contributor.authorM.H.Hsiehen_US
dc.date.accessioned2017-10-06T06:17:35Z
dc.date.available2017-10-06T06:17:35Z
dc.date.issued1968-10en_US
dc.description.abstractMicrowave plasma diagnostic technique based upon the interaction of plasma with low itensity microwave field have been the subject of extensive development in recent years. We intended to carry on a systematic study of the microwave plasma interaction here at the plasma laboratory, Chiao-Tung University. This is the first report of our study. In this article we shall be dealing with a quasi-transverse mode with propagation vector making 45° with respect to the confining magnetic field, while the electric field of the wave is perpendicular to both the D.C. magnetic field and the propagation vector. A short theoretical derivation of the imaginary part of the index of refraction which predominates the attenuation of the probing wave is given. A coputer plotting of the attenuation line shape as function of the confining magnetic field is given, and is found in good agreement to the observed result. The magnitude of the power attenuation is found also in good agreement.en_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/137435
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleMicro-Wave Propagation in Magneto-Plasmaen_US
dc.typeCampus Publicationsen_US

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
HT001298-01.pdf
Size:
795.83 KB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: