Contaminations of MgO Thin Films by Phosphors for the Surface and Vertical Discharge Type AC-PDP

Abstract

The panels were fabricated to characterize the contamination of Magnesium Oxide (MgO) thin films by phosphors and ion bombardments in AC-PDPs. Forty-six inch WVGA panels of the surface and vertical discharge type were manufactured. The experiment was designed to investigate the relationship between the MgO thin films and phosphor contamination caused by ion bombardments in a plasma environment to produce a time lest. The contamination of MgO thin films by phosphors was investigated by way of X-ray photoelectron spectroscopy (XPS).