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Home
學術出版;;Publications
研究計畫;;Research Plans
極平整之超薄氧化層
極平整之超薄氧化層
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Files
882215E009033.pdf
(194.5 KB)
Date
1999
Authors
蔡中
Journal Title
Journal ISSN
Volume Title
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DOI
Abstract
Description
Keywords
超薄
,
氧化層
,
二氧化矽
,
半導體
,
閘極氧化層
,
Ultrathin
,
Oxidation layer
,
SiO2
,
Semiconductor
,
Gate oxide
Citation
URI
https://www.grb.gov.tw/search/planDetail?id=444364&docId=80480
https://ir.lib.nycu.edu.tw/handle/11536/94456
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