High-coercivity CoPt alloy films grown by sputtering
| dc.citation.epage | 4098 | en_US |
| dc.citation.issue | 5 | en_US |
| dc.citation.spage | 4096 | en_US |
| dc.citation.volume | 32 | en_US |
| dc.contributor.author | Hu, JP | en_US |
| dc.contributor.author | Lin, P | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:02:23Z | |
| dc.date.available | 2014-12-08T15:02:23Z | |
| dc.date.issued | 1996-09-01 | en_US |
| dc.description.abstract | CoXPt1-X alloy films (x=0.2 similar to 0.4) were prepared by rf sputtering at substrate temperatures 150 similar to 300 degrees C without Pt underlayer and post annealing. The magnetic properties of the films showed strong dependence on the composition and substrate temperature. High coerivity (similar to 191 KA/m) and saturated remanence were achieved st conditions x=0.25 and 200 degrees C. In contrast to the previous observations, the high perpendicular magnetic anisotropy, is tbe current case, appealed aot associated with the good CoPt (111) texture. Au interpretation based on minor composition modulation is the films was proposed. | en_US |
| dc.identifier.doi | 10.1109/20.539310 | en_US |
| dc.identifier.issn | 0018-9464 | en_US |
| dc.identifier.journal | IEEE TRANSACTIONS ON MAGNETICS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1109/20.539310 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/1062 | |
| dc.identifier.wosnumber | WOS:A1996VM25800238 | |
| dc.language.iso | en_US | en_US |
| dc.title | High-coercivity CoPt alloy films grown by sputtering | en_US |
| dc.type | Article; Proceedings Paper | en_US |