8吋矽晶圓半導體LPCVD製程設備之研發---子計畫I：LPCVD製程設備之加熱及進氣系統設計、流場模擬與系統整合及建立(III)
| dc.contributor.author | 林清發 | en_US |
| dc.contributor.author | LIN TSING-FA | en_US |
| dc.contributor.department | 交通大學機械工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:36:59Z | |
| dc.date.available | 2014-12-13T10:36:59Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2218-E009-002 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=419317&docId=74448 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94315 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 進氣系統 | zh_TW |
| dc.subject | 晶圓 | zh_TW |
| dc.subject | 熱傳導 | zh_TW |
| dc.subject | 催化劑 | zh_TW |
| dc.subject | 熱傳遞 | zh_TW |
| dc.subject | 反應器 | zh_TW |
| dc.subject | Gas feeding system | en_US |
| dc.subject | Wafer | en_US |
| dc.subject | Thermal conductivity | en_US |
| dc.subject | Precursor | en_US |
| dc.subject | Heat transfer | en_US |
| dc.subject | Reactor | en_US |
| dc.title | 8吋矽晶圓半導體LPCVD製程設備之研發---子計畫I：LPCVD製程設備之加熱及進氣系統設計、流場模擬與系統整合及建立(III) | zh_TW |
| dc.title | Heating and Gas Feeding System Design, Flow Simulation, Design and Establishment of a LPCVD Process Equipment (III) | en_US |
| dc.type | Plan | en_US |