Browsing by Author "CHANG, HW"
Now showing 1 - 4 of 4
- Results Per Page
- Sort Options
Item type:Item, ENHANCEMENT OF CF4 AND O2 REACTIVE ION ETCHING RESISTANCE OF POLY(BUTENE-1 SULFONE) BY N2 PLASMA PRETREATMENT(1991-03-14) ;LOONG, WA ;CHANG, HW ;交大名義發表 ;應用化學系National Chiao Tung UniversityThe resistance of poly(butene-1 sulfone) (PBS) to CF4 and oxygen reactive ion etching is greatly enhanced by low power nitrogen plasma pretreatment. The original thickness of PBS can be maintained.Item type:Item, FAULT-TOLERANT ROUTING IN UNIQUE-PATH MULTISTAGE OMEGA NETWORK(1992-12-10) ;CHANG, HW ;CHUNG, KL ;資訊工程學系Department of Computer ScienceIn this paper, two new near one-pass packet-routing schemes are proposed to tolerate all single faults among the switching boxes or the connecting links respectively in a unique-path multistage Omega network. Working in an undirected network, our results can compete with the two-pass routing scheme, which works in a directed network, proposed by Varma.Item type:Item, FAULT-TOLERANT ROUTING IN UNIQUE-PATH MULTISTAGE OMEGA NETWORK(1992-12-10) ;CHANG, HW ;CHUNG, KL ;資訊工程學系Department of Computer ScienceIn this paper, two new near one-pass packet-routing schemes are proposed to tolerate all single faults among the switching boxes or the connecting links respectively in a unique-path multistage Omega network. Working in an undirected network, our results can compete with the two-pass routing scheme, which works in a directed network, proposed by Varma.Item type:Item, PHOTOACID CATALYZED MAIN CHAIN SCISSION OF POLY(BUTENE-1 SULFONE) AS A DEEP UV POSITIVE RESIST(1991-05-01) ;LOONG, WA ;CHANG, HW ;交大名義發表 ;應用化學系National Chiao Tung UniversityPoly(butene-1 sulfone) (PBS), a sensitive e-beam and X-ray resist, is inert to UV light. We found that the addition of a small amount of photoacid, triphenylsulfonium hexafluoroarsenate (TPSHFA), to PBS can catalyze its main chain scission via C-S bond cleavage by 254 nm deep UV exposure and concurrent baking at 80-degrees-C. Therefore, PBS can be used as a deep UV positive resist. The chemistry and resist characteristics of the PBS + TPSHFA system are discussed.