Browsing by Author "Chang, T."
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Item type:Item, A CMOS-Compatible, High RF Power, Asymmetric-LDD MOSFET with Excellent Linearity(2008) ;Chang, T. ;Kao, H. L. ;Chen, Y. J. ;Liu, S. L.McAlister, S. P.We report the performance of 0.18 mu m RF power MOSFETs with an Asymmetric-Lightly-Doped-Drain (LDD) design. Such devices do not have an n-type drain extension and exhibited better characteristics than conventional MOSFETs at same gate length. The devices showed a DC breakdown voltage of 6.9 V, a 0.54 W/mm power density, 115 GHz f(max), and a good adjacent channel power ratio (ACPR) linearity, as well as a 52% drain efficiency at 2.4 GHz.Item type:Item, High Content Nd-Fe-B in Polymer Composite by Fused Depo-sition Modeling(2018-01-01) ;Chang, T. ;Jyun, J. K. ;Lee, W. ;Tsai, M.Cheng, C.Item type:Item, Improved RF Power Performance in a 0.18-mu m MOSFET Which Uses an Asymmetric Drain Design(2008-12-01) ;Chang, T. ;Kao, H. L. ;McAlister, S. P. ;Horng, K. Y.Chin, AlbertWe have fabricated 0.18-mu m asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mu m MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel power ratio. The improvement in the RF power E performance of these MOS transistors suggests that they should be suitable for medium power amplifiers.Item type:Item, The Reliability Study and Device Modeling for p-HEMT Microwave Power Transistors(2011) ;Liu, S. L. ;Chang, H. M. ;Chang, T. ;Kao, H. L.Cheng, C. H.In this paper, the commercial 0.5-mu m AlGaAs/InGaAs/GaAs pseudo-morphic high electron mobility transistors were subjected to both high-drain voltage and high-temperature stresses for investigating reliability issues. The results reveal that the stress-induced trapping phenomena near two-dimensional electron gas layer should be responsible for the different drain current collapses. The decay level of the DC and the small-signal characteristics increases with the stress voltage and/or the operation temperature. The self-consistent model was established through the de-embedded and the non-linear fitting processes, which can be used to estimate the DC and RF small-signal characteristics degradation under high-drain voltage and high-temperature stress.