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Browsing by Author "Chia-Liang"

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    Ferroelectric thin film processing for ferroelectric field-effect transistor
    (2005-02-08)
    Chen
    ;
    San-Yuan
    ;
    Sun
    ;
    Chia-Liang
    ;
    Chin
    The present invention relates to a method for manufacturing a ferroelectric field-effect transistor, particularly to a ferroelectric field-effect transistor with a metal/ferroelectric/insulator/semiconductor (MFIS) gate capacitor structure. The method comprises steps of depositing a bismuth layered ferroelectric film on the insulator buffered Si, after a high-temperature thermal treatment, depositing an upper electrode on the bismuth layered ferroelectric film.