Browsing by Author "Chiang, Chen-Hao"

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A Novel Technique for Growing Crack-Free GaN Thick Film by Hydride Vapor Phase Epitaxy
(2008-11-01)
Huang, Hsin-Hsiung
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Chen, Kuei-Ming
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Tu, Li-Wei
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Chu, Ting-Li
;
Wu, Pei-Lun
To prevent the cracking of GaN thick films grown on a sapphire substrate by hydride vapor phase epitaxy (HVPE), a novel technique without complex processes is developed. By adding a temperature ramping step in the HVPE GaN epitaxy process, more than 300-mu m-thick high-quality crack-free GaN thick films on sapphire substrate can be obtained by this technique. After separation by a conventional laser-induced lift-off process, a 1.5 in. 300 mu m freestanding GaN wafer with a dislocation density of approximately 1 x 10(7) cm(-2) could be fabricated without any cracks. No additional designed-patterned or stress-reduced structures were applied in these samples to reduce the dislocation density and thermal stress. [DOI: 10.1143/JJAP.47.8394]
Analysis of InAsN quantum dots by transmission electron microscopy and photoluminescence
(2008-10-01)
Hsu, Chiung-Chih
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Hsu, Ray-Quen
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Wu, Yue-Han
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Chi, Tung-Wei
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Chiang, Chen-Hao
Quantum dots (QDs) have great potential in optical fiber communication applications were widely recognized. The structure of molecular beam epitaxy (MBE) grew InAsN QDs were investigated by transmission electron microscopy (TEM) and measured their optical properties by photoluminescence (PL). TEM images show that the InAsN QDs are irregular or oval shaped. Some of the InAsN QDs are observed to have defects, such as dislocations at or near the surface in contrast to InAs QDs, which appear to be defect free. PL results for InAsN QDs showed a red-shifted emission peak. In addition, the InAsN emission peak is broader than InAs QDs, which supports the TEM observation that the size distribution of the InAsN QDs is more random than InAs QDs. The results show that the addition of nitrogen to InAs QDs leads to a decrease in the average size of the QDs, bring changes in the QD's shape, compositional distribution, and optical properties. (C) 2008 Published by Elsevier B.V.
Effects of Al(x)Ga(1-x)N interlayer for GaN epilayer grown on Si substrate by metal-organic chemical-vapor deposition
(2010-05-01)
Lin, Kung-Liang
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Chang, Edward-Yi
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Hsiao, Yu-Lin
;
Huang, Wei-Ching
;
Luong, Tien-Tung
GaN film grown on Si substrate using multilayer AlN/Al(x)Ga(1-x)N buffer is studied by the low-pressure metal-organic chemical-vapor deposition method. The Al(x)Ga(1-x)N films with Al composition varying from 1 to 0.66 were used to accommodate the stress induced between GaN and the Si substrate during GaN growth. The correlation of the Al composition in the Al(x)Ga(1-x)N films with respect to the stress induced in the GaN film grown was studied using high-resolution x-ray diffraction, including symmetrical and asymmetrical omega/2 theta scans and reciprocal space maps. It is found that with proper design of the Al composition in the Al(x)Ga(1-x)N buffer layer, crack-free GaN film can be successfully grown on 6 in. Si (111) substrates using multilayer AlN and Al(x)Ga(1-x)N buffer layers. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3385672]
Electron Emission Properties of GaAsN/GaAs Quantum Well Containing N-Related Localized States: The Influence of Illuminance
(2012-02-01)
Hsieh, Meng-Chien
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Wang, Jia-Feng
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Wang, Yu-Shou
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Yang, Cheng-Hong
;
Chiang, Chen-Hao
This study elucidates the electron emission properties of GaAsN/GaAs quantum well containing N-related localized states under illumination. The N-related localized states in a GaAsN quantum well (QW) are identified as both optical and electrical electron trap states. The mechanisms for the responses of current-voltage (I-V) measurement under illumination and photocapacitance are investigated. N-related localized states in GaAsN QW can extend response range and response sensitivity on photocapacitance, and produce an additional current path for photo-generated electron-hole pairs. Furthermore, exactly how illumination influences the electron emission rate of GaAsN QW electron state is examined. The electron emission rate of GaAsN QW electron state can be modulated by different incident photon energy, which is due to the modulation of depletion width of the bottom GaAs. (C) 2012 The Japan Society of Applied Physics
Homoepitaxy on GaN substrate with various treatments by metalorganic vapor phase epitaxy
(2011-03-01)
Chen, Kuei-Ming
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Wu, Yin-Hao
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Yeh, Yen-Hsien
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Chiang, Chen-Hao
;
Chen, Kuei-You
This study shows the morphological, optical, and crystal characteristics of homoepitaxial GaN epilayers that were overgrown by metalorganic vapor phase epitaxy (MOVPE) on the Ga-polar face of GaN substrates that had undergone various surface treatments. The MOVPE overgrown epilayer with surface treatment was fine polished (sample C) to obtain a flat surface that exhibits two-dimensional step-flow growth. And the interface between the MOVPE overgrown epilayer and the GaN substrate was completely absent, indicating the continuous growth of GaN, and, correspondingly, the high degree of homoepitaxy. However, a network of cracks appeared in as-grown sample A (mechanically polished) and hillocks formed with the striped morphology in as-grown sample B (ICP treated). The dislocation density and full width at half maximum (FWHM) obtained by X-ray measurements of as-grown sample C were superior to those obtained by other surface treatments and the original GaN substrate. According to the photoluminescence (PL) and cathodoluminescence (CL) measurements, the decreasing FWHM of band edge emission (NBE) of the overgrown epilayers was attributable to the point defects of V(N) being greatly reduced. Additionally, cross-sectional transmission electron microscopy (TEM) revealed that many threading dislocations formed in sample A by edge type dislocations and intermittently appeared due to inter-crack. (C) 2010 Elsevier B.V. All rights reserved.
MANUFACTURE METHOD OF MULTILAYER STRUCTURE HAVING NON-POLAR A-PLANE III-NITRIDE LAYER
(2010-08-05)
Lee, Wei-I
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Chen, Jenn-Fang
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Chiang, Chen-Hao
A manufacture method of a multilayer structure having a non-polar a-plane {11-22} III-nitride layer includes forming a nucleation layer on a r-plane substrate, wherein the nucleation layer is composed of multiple nitride layers; and forming a non-polar a-plane {11-20} III-nitride layer on the nucleation layer. The nucleation layer features reduced stress, reduced phase difference of lattice, blocked elongation of dislocation, and reduced density of dislocation. Thus, the non-polar a-plane {11-20} III-nitride layer with flat surface can be formed.
Method for modulating the wafer bow of free-standing GaN substrates via inductively coupled plasma etching
(2010-12-01)
Chen, Kuei-Ming
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Yeh, Yen-Hsien
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Wu, Yin-Hao
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Chiang, Chen-Hao
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Yang, Din-Ru
The bowing curvature of the free-standing GaN substrate significantly decreased almost linearly from 067 to 0 056 m(-1) (i e the bowing radius increased from 1 5 to 178 m) with increase in inductively coupled plasma (ICP) etching time at the N-polar face and eventually changed the bowing direction from convex to concave Furthermore the Influences of the bowing curvature on the measured full width at half maximum (FWEIM) of high-resolution X-ray diffraction (HRXRD) in (0 0 2) reflection were also deduced which reduced from 176 8 to 888 arcsec with increase in ICP etching time Decrease in the nonhomogeneous distribution of threading dislocations and point defects as well as V(Ga)-O(N) complex defects on removing the GaN layer from N-polar face which removed large amount of defects was one of the reasons that improved the bowing of the free-standing GaN substrate Another reason was the high aspect ratio of needle-like GaN that appeared at the N-polar face after ICP etching which released the compressive strain of the free-standing GaN substrate By doing so crack-free and extremely flat free-standing GaN substrates with a bowing radius of 178 m could be obtained (C) 2010 Elsevier B V All rights reserved
MOVPE high quality GaN film grown on Si (111) substrates using a multilayer AlN buffer
(2008)
Lin, Kung-Liang
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Chang, Edward-Yi
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Huang, Jui-Chien
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Huang, Wei-Ching
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Hsiao, Yu-Lin
High quality GaN films were successfully grown on Si (111) substrates using the MOVPE method and a multilayer AlN buffer. The buffer layer film quality and thickness are critical for the growth of the crack-free GaN film on Si (111) substrates. Cracks started to form on the single layer high temperature (HT) AlN film, grown on Si (111) substrate as the AlN thickness was greater than 20 nm. However, a 100 nm crack-free AlN film, can be obtained when multilayer buffer of HT-AlN/low temperature (LT)-AlN/HT-AlN was grown on the Si(111) substrate. By using multilayer AlN buffer, a 2 mu m crack-free GaN film was successful grown on the 2 '' Si (111) substrate. Moreover, the GaN film (2 mu m thick) grown on Si with a GaN (004) Mosaic FWHM of only 0.12 degrees.
Photoluminescence Study of Interdot Carrier Transfer on Strain-relaxed InAs Quantum Dots
(2011)
Chiang, Chen-Hao
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Chang, You-Cheng
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Wu, Yue-Han
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Hsieh, Meng-Chien
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Yang, Cheng-Hong
Photoluminescence (PL) properties of the strain relaxed InAs quantum dots (QDs) are studied as a function of temperature from 10 to 300 K. Two groups of QDs induced by strain relaxation are observed in the PL spectra. The PL peak position of the relaxed (non-relaxed) QDs locates at a higher (lower) energy. TEM image prove QDs are distributed into two groups and indicate the QDs relax the strain by diffusing indium to GaAs. In the 120- 200 K temperature range, there are abnormal temperature behaviors attributed to the carrier transfer from the relaxed to non-relaxed QDs.
Role of the N-related localized states in the electron emission properties of a GaAsN quantum well
(2011-11-15)
Hsieh, Meng-Chien
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Wang, Jia-Feng
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Wang, Yu-Shou
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Yang, Cheng-Hong
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Chen, Ross C. C.
This study elucidates the influence of the N-related localized states on electron emission properties of a GaAsN quantum well (QW) that is grown by molecular beam epitaxy. The N-related localized states in a GaAsN QW are identified as both optical and electrical electron trap states. Furthermore, exactly how N-related localized states influence the electron emission properties of a GaAsN quantum well is examined. The presence of N-related localized states effectively suppresses the tunneling emission of GaAsN QW electron states, leading to a long electron emission time for the GaAsN QW electron states. Thermal annealing can reduce the number of N-related localized states, resulting in a recovery of the tunneling emission for GaAsN QW electron states. Increasing the annealing temperature can restore the electron emission behavior of GaAsN QW to the typical electron tunneling emission for a high-quality QW. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3663436]
Stress and Defect Distribution of Thick GaN Film Homoepitaxially Regrown on Free-Standing GaN by Hydride Vapor Phase Epitaxy
(2010)
Chen, Kuei-Ming
;
Yeh, Yen-Hsien
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Wu, Yin-Hao
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Chiang, Chen-Hao
;
Yang, Din-Ru
A 220-mu m-thick Gallium nitride (GaN) layer was homoepitaxially regrown on the Ga-polar face of a 200-mu m-thick free-standing c-plane GaN by hydride vapor-phase epitaxy (HVPE). The boundary of the biaxial stress distribution in the GaN substrate after regrowth was clearly distinguished. One half part, the regrown GaN, was found to be more compressive than the other half part, the free-standing GaN. Additionally, the densities of the screw and mixed dislocations reduced from 2.4 x 10(7) to 6 x 10(6) cm(-2) after regrowth. Furthermore, the yellow band emission almost disappeared, accompanied by a peak emission at approximately 380 nm related to the edge dislocation was under slightly improved in regrown GaN. We conclude that the reduction of the dislocation defects and Ga vacancies and/or O impurities are the two main reasons for the higher compressive stress in the regrown GaN than in the free-standing GaN, causing the curvature of the GaN substrate to be twice concave after regrowth. (C) 2010 The Japan Society of Applied Physics