Browsing by Author "Hsiao, CW"

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Impact of air filter material on metal oxide semiconductor (MOS) device characteristics in HF vapor environment
(2004-05-15)
Hsiao, CW
;
Lou, JC
;
Yeh, CF
;
Hsieh, CM
;
Lin, SJ
Airborne molecular contamination (AMC) is becoming increasingly important as devices are scaled down to the nanometer generation. Optimum ultra low penetration air (ULPA) filter technology can eliminate AMC. In a cleanroom, however, the acid vapor generated from the cleaning process may degrade the ULPA filter, releasing AMC to the air and the surface of wafers, degrading the electrical characteristics of devices. This work proposes the new PTFE ULPA filter, which is resistant to acid vapor corrosion, to solve this problem. Experimental results demonstrate that the PTFE ULPA filter can effectively eliminate the AMC and provide a very clean cleanroom environment.
Impact of airborne molecular contamination to nano-device performance
(2002)
Yeh, CF
;
Hsiao, CW
;
Lin, SJ
;
Xie, ZM
;
Kusumi, T
In this paper, we detected most airborne molecular contamination (AMC) in present cleanroom and in our specially equipped clean bench through air sampling and wafer sampling experiments. And then we investigate the AMC on device performance under different filter modules. We discovered that the NEUROFINE PTFE filter combines with the chemical filters have excellent controlling ability of metal, organic and inorganic contaminations. We believe that the novel filter combination can be used to further improve device manufacturing environment when device is continuously scaled down to nanometer generation.
In the blink of a silicon eye
(2001-05-01)
Cheng, CH
;
Wu, CY
;
Sheu, B
;
Lin, LJ
;
Huang, KH
Novel post CMP cleaning using buffered HF solution and ozone water
(2003-06-30)
Yeh, CF
;
Hsiao, CW
;
Lee, WS
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
Post chemical mechanical polishing (CMP) cleaning is a key process for copper (Cu) CMP in dual damascene interconnection technology. During the post CMP cleaning, it is an important issue to minimize organic and Cu contamination residues on the dielectric surface. This study proposed a novel post CMP cleaning using HAL buffer hydrofluoric (BHF) solution and ozone (O-3) water cleaning. The performance of the proposed cleaning technology was investigated and compared to conventional citric solution cleaning, which is currently used in post Cu CMP cleaning. From roughness, contamination residues and electrical characteristics, the proposed cleaning technology showed better performance than citric solution cleaning did. This excellent cleaning performance is attributed to the surface etching and contamination elimination effect of HAL BHF solution and O-3 water. Based on the experimental results, the proposed cleaning technology is feasible and superior to the conventional post CMP cleaning. (C) 2003 Elsevier Science B.V. All rights reserved.
The ac effect of vortex pinning in the arrays of defect sites on Nb films
(2006-04-15)
Wu, TC
;
Horng, L
;
Wu, JC
;
Hsiao, CW
;
Kolacek, J
Niobium thin films with spacing-graded array of submicrometer-scaled holes had been fabricated using electron beam lithography through a lift-off technique. The magnetoresistance measurements and current-voltage characteristics were carried out with the external magnetic field applied perpendicular to the film plane, in which commensurable effects were observed in both experiments. The magnetoresistance with positive/negative directions of dc current revealed identical curves except the dips at matching fields separated. Two distinct current-voltage curves, which resulted from the positive and negative applied current directions, respectively, were discerned when the external magnetic field was fixed at the matching field, which is believed to be due to asymmetry pinning potential in the spacing-graded array of holes. In addition, ac current-voltage curve measured at matching field showed a ratchet bump along with another extra peak associated with incommensurable effect. (C) 2006 American Institute of Physics.
The removal of airborne molecular contamination in cleanroom using PTFE and chemical filters
(2004-05-01)
Yeh, CF
;
Hsiao, CW
;
Lin, SJ
;
Hsieh, CM
;
Kusumi, T
Cleanroom contamination and its impact on the performance of devices are beginning to be investigated due to the increasing sensitivity of the semiconductor manufacturing process to airborne molecular contamination (AMC). A clean bench was equipped with different filter modules and then most AMC in the cleanroom and in the clean bench was detected through air-sampling and wafer-sampling experiments. Additionally, the effect of AMC on device performance was examined by electrical characterization. A combination of the NEUROFINE PTFE filter and chemical filters was found to control metal, organic, and inorganic contamination. We believe that the new combination of filters can be used to improve the manufacturing environment of devices, which are being continuously shrunk to the nanometer scale.
Vortex dynamics in spacing-graded array of defects on a niobium film
(2006-05-15)
Wu, TC
;
Horng, L
;
Wu, JC
;
Hsiao, CW
;
Kolacek, J
We have investigated the vortex dynamics in the niobium films having a spacing-graded array of pinning sites. The samples were fabricated by using electron beam lithography through a lift-off technique. The pinning sites of 200 nm in diameter were arranged with a constant hole-defect separation in x-axis direction and graded separation in y-axis direction from 392 nm to 408 nm. The magneto-resistance measurements and current-voltage characteristics were explored with the external magnetic field applied perpendicular to the film plane. Dc current-voltage measured at matching field revealed two distinct curves resulted from the positive and negative applied current directions, respectively. This is believed to be due to an asymmetry pinning potential formed in the spacing-graded array of holes, giving rise to asymmetry Lorentz forces. De voltage drop measured with respect to the ac current applied along the x-axis of the sample showed two separated maxima, which can be explained using the dynamics of pinned vortex lattice and interstitial vortices in the asymmetry pinning landscape. (c) 2006 Elsevier B.V. All rights reserved.