Browsing by Author "Ku, YHJ"

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A novel operation method to avoid overerasure in a scaled trapping-nitride localized charge storage flash memory cell and its application for multilevel programming
(2006-04-01)
Tsai, WJ
;
Zous, NK
;
Wang, TH
;
Ku, YHJ
;
Lu, CY
By using the charge pumping technique, it was found that the injected-hole occupied percentage increases with respect to the whole channel, and overerasure thus happens in a scaled trapping-nitride storage Flash memory cell. Such overerasure can be avoided or can be recovered if the cell is suitably biased during the erase operation. Moreover, the erase threshold voltage can be well controlled by the applied erase gate voltage. The reason is that both the channel-hot electrons and the band-to-band tunneling-induced hot holes would inject at the same time and are in balance as a specific surface potential is achieved. Based on this study, a self-limited soft program, as well as a self-saturated erase scheme, is proposed. Applications of this concept to multilevel programming are also demonstrated.
A novel PHINES flash memory cell with low power program/erase, small pitch, two-bits-per-cell for data storage applications
(2005-04-01)
Yeh, CC
;
Wang, TH
;
Tsai, WJ
;
Lu, TC
;
Chen, MS
A novel programming by hot-hole injection nitride electron storage (PHINES) Flash memory technology is-developed. The memory bit size of 0.046 mu m(2) is fabricated based on 0.13-mu m technology. PHINES cell uses a nitride trapping storage cell structure. Fowler-Nordheim (FN) injection is performed to raise V-t in erase while programming is done by lowering a local V-t through hand-to-hand tunneling-induced hot hole (BTBT HH) injection. Two-bits-per-cell feasibility, low-power and high-speed program/erase, good endurance and data retentivity make it a promising candidate for Flash EEPROM technology in gigabit era applications.
Characterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping technique
(2006-01-01)
Gu, SH
;
Wang, TH
;
Lu, WP
;
Ting, WC
;
Ku, YHJ
In this paper, we use a modified charge pumping technique to characterize the programmed charge lateral distribution in a hot electron program/hot hole erase, two-bit storage nitride Flash memory cell. The stored charge distribution of each bit over the source/drain junctions can be profiled separately. Our result shows that the second programmed bit has a broader stored charge distribution than the first programmed bit. The reason is that a large channel field exists under the first programmed bit during the second bit programming. Such a large field accelerates channel electrons and causes earlier electron injection into the nitride. In addition, we find that programmed charges spread further into the channel as program/erase cycle number increases.