Browsing by Author "Nowka, Kevin J."

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Stable High-Density FD/SOI SRAM with Selective Back-Gate Bias Using Dual Buried Oxide
(2008)
Kim, Keunwoo
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Kuang, Jente B.
;
Gebara, Fadi
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Ngo, Hung C.
;
Chuang, Ching-Te
TCAD/Physics-Based Analysis of High-Density Dual-BOX FD/SOI SRAM Cell With Improved Stability
(2009-12-01)
Kim, Keunwoo
;
Kuang, Jente B.
;
Gebara, Fadi H.
;
Ngo, Hung C.
;
Chuang, Ching-Te
This paper presents a new SRAM cell using a global back-gate bias scheme in dual buried-oxide (BOX) FD/SOI CMOS technologies. The scheme uses a single global back-gate bias for all cells in the entire columns or subarray, thereby reducing the area penalty. The scheme improves 6T SRAM standby leakage, read stability, write ability, and read/write performance. The basic concept of the proposed scheme is discussed based on physical analysis/equation to facilitate device parameter optimization for SRAM cell design in back-gated FD/SOI technologies. Numerical 2-D mixed-mode device/circuit simulation results validate the merits and advantages of the proposed scheme.