Browsing by Author "Weng, Yung-Chun"
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Item type:Item, Automatic Positioning Device Design for The Operation Platform of Nano-indentation(2009) ;Weng, Yung-Jin ;Weng, Yung-Chun ;Fang, Huang-Sheng ;Wong, Yong-ChengKe, Chih-YuIn this paper, we try to measure the differences among the indentations of single crystal bulks under different rotation angles by nanoindentation test. Besides, we also give a design of positioning device for the nanoindentation measuring system. It is driven by stepping motors and relevant circuits for controlling the rotations of the wafer supporting platform. The drive circuit is connected with microprocessors. The rotation angle of the platform can be adjusted by instructions so that the system can be used to carry out nanoindentation tests in different angles for more precise mechanical properties data of the nanoindentation materials.Item type:Item, Fabrication of Microlens Arrays by Using Nano-Particle Fluid Imprinting Technology(2009) ;Weng, Yung-Jin ;Weng, Yung-Chun ;Huang, Jen-Ching ;Wong, Yong-ChengYang, Sen-YeuIn this study, we look into an innovative technology which utilizes nano-particles as a medium for imprinting. This technology integrates the advantages of soft lithography, photo-cure resist, and gas assisted imprinting. We try to produce micro-lens arrays by gas-assisted nano-particles based soft mould imprinting on photo-cure resists. It helps the application and technology of nano-imprinting becoming more sophisticated. We rind that PDMS can be used to precisely replicate micro-to-nano-meter level micro-structures. Together with nano-particles and well-proportioned gas pressure, we can construct a perfect shape of micro-structures and achieve a conformal contact with the surface of base material. It increases the effective imprinting area significantly and improves the replication capability of the transfer. Meanwhile, the PDMS soft mould is easy for production and fast in replication, which reduces the cost remarkably. Furthermore, it has a low surface free energy and low viscosity to the resists. Integrating gas assisted nano-particles imprinting can be a great advantage in the process of micro-structure.Item type:Item, Fabrication of Optical Waveguide Devices Using Electromagnetic Assisted Nanoimprinting(2009) ;Weng, Yung-Jin ;Weng, Yung-Chun ;Wong, Yong-Cheng ;Yang, Sen-YeuLiu, Hsu-KangA creative technology was used in this research. Using the PDMS flexible mold magnetic powder method to transmit imprinting, and by combining the special characteristics of the soft lithography, polymethylmethacrylate (PMMA), and electromagnetic Plate uniform control pressing technology, researching the use of magnetic flexible mold imprinting technology to produce the optical waveguide devices, so as to allow the usage and the technology of micro hot embossing or nanoimprinting more mature.Item type:Item, Fabrication of Ridge Waveguide Microstructure Using Vacuum-assisted Micromolding Technology(2009) ;Weng, Yung-Jin ;Weng, Yung-Chun ;Wong, Yong-Cheng ;Liu, Hsu-Kang機械工程學系Limited by light source wavelength and tight diffraction, nanostructure fabrication is tough, but it needs multiple special and expensive processes (e.g.: E-beam). The common problems are complex and slow processing, expensive manufacturing equipment and material, and it is very unsuitable for mass production; therefore, it\'s of utmost importance to develop a nanoscale, high resolution and costefficient next generation semiconductor process. This study integrated PDMS soft mold, photo resist(SU-8 2035) and vacuum pumping equipment, as well as researched and developed a vacuum-assisted photo resistant microstructure filling technique, and combined soft mold to fabricate waveguide microstructure. Conformal contact was obtained between PDMS soft mold and substrate surface, with low surface free energy, and resistance of sticking to resist in filling. Vacuum equipment was used to enable compact and complete resistant filling, and it can not only greatly increase the effective filling area, but, without residue after filling. There is no need for post treatment removing of the residual layer; it can well lower cost and reduce process time, so that the microstructure component manufacturing technique and application can be more mature.