<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css">

Browsing by Author "Wensyang"

Now showing 1 - 3 of 3
  • Thumbnail Image
    Item type:Item,
    Method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof
    (2004-10-26)
    Hsu
    ;
    Wensyang
    ;
    Chou
    ;
    Hsueh Liang
    ;
    Tien
    The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture.
  • Thumbnail Image
    Item type:Item,
    Microelectro mechanical system for magneto-optic data storage apparatus
    (2006-02-21)
    Hsu
    ;
    Wensyang
    ;
    Shieh
    ;
    Han-Ping
    ;
    Sun
    The present invention relates to a Microelectro mechanical system structure. More specifically the invention relates to utilize a sacrificial layer to fabricate an air bearing structure, followed by forming an aperture, and reducing the aperture to nano-scale by electroplating. And then, by using of two thick film photoresist films for twice electroplating fabrication, for fabricate metal microcoils having high aspect ratio structure and interconnection metal line, to achieve efficiencies of utilizing area and reducing resistance. Moreover, proceed lithography depends on different portions and exposure dose. Then form a single photoresist film to have a specific dimension and thickness structure, finally, by using reflow process, forming a magneto-optic (MO) pickup head comprises of Supersphere Solid Immersion Lens (SSIL), nano-aperture, microcoils and air bearing by using an integrated fabrication, with advantages such as no high cost device and precise apparatus are required in the process of fabrication, mass production in batch fabrication, without step of assembly, for high-density data storage and rewritable record.
  • Thumbnail Image
    Item type:Item,
    Process for fabricating supersphere solid immersion lens
    (2006-08-01)
    Hsu
    ;
    Wensyang
    ;
    Sun
    ;
    Yi-Ting
    The present invention relates to process for fabricating supersphere solid immersion lens (SSIL). The procedure of the present invention comprises the steps of: firstly, coating a positive photoresist layer on a substrate, followed by first exposure and second exposure with different exposure dose separately by first mask and second mask to form the positive photoresist structure with different dimensions and depths. The first exposure dose is supplied enough to make sure the patterns of the first mask can be observed on the positive photoresist layer during the alignment of the second exposure process. And the following reflow process forms a supersphere solid immersion lens (SSIL) structure.