| 標題: | 下一世代鍺基板電子元件 Next Generation Ge-Based Electronic Devices |
| 作者: | 荊鳳德 CHIN ALBERT 國立交通大學電子工程學系及電子研究所 |
| 公開日期: | 2010 |
| 官方說明文件#: | NSC98-2221-E009-163-MY3 |
| URI: | http://hdl.handle.net/11536/100119 https://www.grb.gov.tw/search/planDetail?id=2009966&docId=328847 |
| 顯示於類別： | 研究計畫 |
- 下一世代鍺基板電子元件 / 荊鳳德;CHIN ALBERT
- 下一世代鍺基板電子元件 / 荊鳳德;CHIN ALBERT
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- High Photoresponsivity Ge-dot PhotoMOSFETs for Low-power Monolithically-Integrated Si Optical Interconnects / Kuo, Ming-Hao;Lee, Meng-Chun;Lin, Horng-Chih;George, Tom;Li, Pei-Wen
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