新穎材料開發關鍵核心設施計畫---雷射分子束氧化物磊晶平台

Abstract

本計劃希望藉由雷射分子束磊晶之建立，可以快速大幅提升我國 學界與業界在氧化物磊晶研發之實力。氧化物材料具有多樣之結 構特性，可以形成簡單之二元氧化物，亦可形成複雜之多元氧化 物，同時包含許多特殊之優良性質，舉凡超導特性、巨磁阻特性、 焦電、壓電、介電、半導、導電、磁性、光性等，幾乎包含所有 物理性質。氧化物電子目前正蓬勃之發展，為下一個世代之電子 元件提供另一種解決方案。計劃要建立之系統雷射分子束磊晶平 台，將具有高工作氣壓之RHEED 來進行臨場薄膜之成長，同時將 搭配LEED 與Time Of Flight - Ion Scattering and Recoil Spectroscopy 還有XPS，用來檢測表面之結構、組成與電子態， 亦將加入Raman 又來監控降溫時之相變化過程，這樣的系統可以 提供氧化物磊晶薄膜技術龐大之資料庫。此一磊晶成長平台一旦 建立，可以快速提昇我國於氧化物磊晶成長之基礎能力，可以繼 續利用此平台研發新穎與新功能之材料。高品質之材料為固態物 理研究之基石，此平台建立後，可以為以量測為主之研究群，提 供樣品確保其樣品之品質。另外對於成長氧化物磊晶有興趣之研 究群，這樣的平台提供共同研發之機會，可以藉由計畫主持人長 期之經驗，快速的建立起新製程，以利其他研究群材料之快速開 發。此一平台亦提供業界快速取得多功能與高品質之氧化物磊 晶，有助於縮短業界開發新製程與元件之研發時間，同時間由於 各種氧化物搭配，亦可由此一平台提供，亦可提供業界元件製程 與整合所遇到困難之解決方案。

Oxide materials are gifted systems, providing a variety of physical properties, including superconducting, ferroelectric, piezoelectric, magnetic, CMR, optical, conducting and et al. The combinations of these properties provide new solutions of next-generation electron devices. The goal of this project is to build up a laser molecule beam epitaxy (MBE) system to fabricate epitaxial oxide heterostructures. Because it has the advantages of high quality epitaxial growth, fast optimization, and good composition and interface control, it has been a core technology on developing oxide heterostructures for many years. Such a platform will greatly promote the ability of studying oxide electronics in academia and industry. The laser MBE proposed here will combine high pressure RHEED to in-situ monitor the growth of oxide films, will also combine LEED, Time of Flight – ion scattering and recoil spectroscopy, and XPS to study the surface structure, termination of surface, and surface compositions, respectively. Moreover, in-situ Raman will also be included to control the phase transformation during the cooling process. Such a system will help us to build up a database for oxide epitaxial growth and to understand the fundamental physics in behind. Such a platform can be used to develop new functional oxide materials and heterostructures. It can also be used to provide high-quality epitaxial oxide films for research groups to do other detail measurements. It can also be used as a platform for industry to develop new oxide devices. It will be an efficient approach to integrate research energy in academia and industry.