The effects of plasma treatment on the thermal stability of HfAlOx thin films

標題:	The effects of plasma treatment on the thermal stability of HfAlOx thin films
作者:	Chang, Kow-Ming Chen, Bwo-Ning Huang, Shih-Ming 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	2007
URI:	http://hdl.handle.net/11536/12045
ISBN:	978-1-4244-1891-6
期刊:	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2
起始頁:	181
結束頁:	182
顯示於類別：	會議論文