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以離子植入技術改善鍺超淺接面與超低接觸阻抗( II )
以離子植入技術改善鍺超淺接面與超低接觸阻抗( II )
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Date
2015
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https://www.grb.gov.tw/search/planDetail?id=11606547&docId=474534
https://ir.lib.nycu.edu.tw/handle/11536/130127
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