標題: | Study on Transparent Amorphous Indium Oxide Thin Film Transistors Technology |
作者: | Chang, Chih-Hsiang Lai, Yu-Chia Fan, Yang-Shun Chang, Che-Chia Liu, Po-Tsun 電子工程學系及電子研究所 光電工程學系 顯示科技研究所 Department of Electronics Engineering and Institute of Electronics Department of Photonics Institute of Display |
公開日期: | 2015 |
摘要: | In this study, we analyzed the In2O3 thin flints with different oxygen How rate during sputtering as the transistor\'s channel layer. The electrical analysis including device\'s reliability and material analysis were both examined. |
URI: | http://hdl.handle.net/11536/136105 |
ISBN: | 978-1-4799-9928-6 |
ISSN: | 1946-1550 |
期刊: | PROCEEDINGS OF THE 22ND INTERNATIONAL SYMPOSIUM ON THE PHYSICAL AND FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA 2015) |
起始頁: | 374 |
結束頁: | 378 |
顯示於類別: | 會議論文 |