CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS

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A1994BB55A00030.pdf (444 KB)

Date

Authors

DOI

10.1117/12.186067

Keywords

PE-SIN , UV-TRANSMITTANCE , EPROM

URI

http://dx.doi.org/10.1117/12.186067
https://ir.lib.nycu.edu.tw/handle/11536/20116

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會議論文;;Conferences Paper