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dc.contributor.authorChang, Tsuen_US
dc.contributor.authorKao, Hsuan-Lingen_US
dc.contributor.authorChen, Y. J.en_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2014-12-08T15:07:59Z-
dc.date.available2014-12-08T15:07:59Z-
dc.date.issued2010en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/6275-
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.49.034201en_US
dc.description.abstractWe have characterized and modeled the radio frequency (RF) power performance of a 0.18 mu m asymmetric-lightly-doped-drain metal-oxide-semiconductor field-effect transistor (LDD MOSFET). In comparison with the conventional 0.18 mu m MOSFET, this asymmetric-LDD device shows a larger power density of 0.54 W/mm, and 8 dB better adjacent channel power ratio (ACPR) linearity at 2.4 GHz from the improved twice DC breakdown voltage of 6.9 V. These significant improvements of RF power performance in the asymmetric-LDD transistor are important for the medium RF power amplifier application. (C) 2010 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleImproved Radio Frequency Power Characteristics of Complementary Metal-Oxide-Semiconductor-Compatible Asymmetric-Lightly-Doped-Drain Metal-Oxide-Semiconductor Transistoren_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.49.034201en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume49en_US
dc.citation.issue3en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000276386100044-
dc.citation.woscount0-
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