加速加熱化學氣相沈積對超薄介電層和選擇性磊晶之研究(II)

dc.contributor.author	蘇翔	zh_TW
dc.contributor.author	孫喜眾	zh_TW
dc.contributor.department	交通大學電子研究所	zh_TW
dc.date.accessioned	2016-12-20T03:57:06Z
dc.date.available	2016-12-20T03:57:06Z
dc.date.issued	1993	en_US
dc.description.abstract		zh_TW
dc.description.abstract		en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC82-0404-E009-234	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=45972&docId=6597	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/132160
dc.language.iso	zh_TW	en_US
dc.subject		zh_TW
dc.subject		en_US
dc.title	加速加熱化學氣相沈積對超薄介電層和選擇性磊晶之研究(II)	zh_TW
dc.title	Rapid Thermal Chemical Vapor Deposition for Ultrathin Dielectrics & Selective Epitaxy (II)	en_US
dc.type	Plan	en_US

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