FABRICATION AND CHARACTERISTICS OF RF MAGNETRON-SPUTTERED ITO THIN-FILMS
| dc.citation.epage | 325 | en_US |
| dc.citation.spage | 319 | en_US |
| dc.citation.volume | 2150 | en_US |
| dc.contributor.author | WU, WF | en_US |
| dc.contributor.author | CHIOU, BS | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:27:50Z | |
| dc.date.available | 2014-12-08T15:27:50Z | |
| dc.date.issued | 1994 | en_US |
| dc.identifier.doi | 10.1117/12.175003 | en_US |
| dc.identifier.isbn | 0-8194-1445-X | en_US |
| dc.identifier.journal | DESIGN, SIMULATION, AND FABRICATION OF OPTOELECTRONIC DEVICES AND CIRCUITS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.175003 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/20081 | |
| dc.identifier.wosnumber | WOS:A1994BA43F00036 | |
| dc.language.iso | en_US | en_US |
| dc.title | FABRICATION AND CHARACTERISTICS OF RF MAGNETRON-SPUTTERED ITO THIN-FILMS | en_US |
| dc.type | Proceedings Paper | en_US |