Critical voltage reduction by alignment layer modification in Pi-cells
| dc.citation.epage | 694 | en_US |
| dc.citation.spage | 692 | en_US |
| dc.contributor.author | Wu, Wei-Ching | en_US |
| dc.contributor.author | Chen, Yi-Fan | en_US |
| dc.contributor.author | Chen, Szu-Fen | en_US |
| dc.contributor.author | Chen, Huang-Ming Philip | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:12:14Z | |
| dc.date.available | 2014-12-08T15:12:14Z | |
| dc.date.issued | 2007 | en_US |
| dc.description.abstract | A new approach which can effectively lower the critical voltage (Vcr) of pi cell has been realized in this study. New structure of pi r cell can increase the control range of driving voltage, which makes the gray scale manipulation near Vcr more stable without loosing the fast response property. | en_US |
| dc.identifier.isbn | 978-957-28522-4-8 | en_US |
| dc.identifier.journal | IDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/9401 | |
| dc.identifier.wosnumber | WOS:000258177700186 | |
| dc.language.iso | en_US | en_US |
| dc.title | Critical voltage reduction by alignment layer modification in Pi-cells | en_US |
| dc.type | Proceedings Paper | en_US |
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