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Enhancement Performance of GaN-based Light-emitting Diodes by Modified Patterned Sapphire Surface

dc.citation.epage69en_US
dc.citation.issue13en_US
dc.citation.spage67en_US
dc.citation.volume33en_US
dc.contributor.authorLin, B-W.en_US
dc.contributor.authorHsu, W-C.en_US
dc.contributor.authorWu, Y. S.en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:29:06Z
dc.date.available2014-12-08T15:29:06Z
dc.date.issued2010en_US
dc.description.abstractThe PSSs were fabricated by wet etching. Compared with the platform-PSS, the modified-PSS was still capped with a layer on the top platform after wet etching. The output power of the platform-PSS LED and modified-PSS are 27.3 mW and 29 mW, respectively, at an injection current of 20 mA. The output power of the modified-PSS LED is enhanced 6% compared with the platform-PSS. The results reveal that both electrical properties and optical properties of modified-PSS LED were improved.en_US
dc.identifier.doi10.1149/1.3485608en_US
dc.identifier.isbn978-1-56677-832-9en_US
dc.identifier.issn1938-5862en_US
dc.identifier.journalSTATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS 52 (SOTAPOCS 52)en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3485608en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/20996
dc.identifier.wosnumberWOS:000313569400006
dc.language.isoen_USen_US
dc.titleEnhancement Performance of GaN-based Light-emitting Diodes by Modified Patterned Sapphire Surfaceen_US
dc.typeProceedings Paperen_US

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